LOW-MAINTENANCE COATINGS, AND METHODS FOR PRODUCING LOW-MAINTENANCE COATINGS

• US 20100326817A1
• Filed: 09/03/2010
• Published: 12/30/2010
• Est. Priority Date: 09/14/2007
• Status: Active Grant

• Current Assignee: Cardinal CG Company (Cardinal Glass Industries Incorporated)
• Original Assignee: Cardinal CG Company (Cardinal Glass Industries Incorporated)
• Inventors: Brownlee, James Eugene, Krisko, Annette J., Myli, Kari B., Pfaff, Gary L.
• Granted Patent: US 8,506,768 B2
• Time in Patent Office: Days
• US Class Current: 204/192.15
• CPC Class Codes: C03C 17/002 for flat glass, e.g. float glass
• CPC Class Codes: C03C 17/2456 Coating containing TiO2
• CPC Class Codes: C03C 17/3411 with at least two coatings of inorganic materials C03C17/36, C03C17/42 take precedence
• CPC Class Codes: C03C 2217/212 TiO2
• CPC Class Codes: C03C 2217/219 CrOx, MoOx, WOx
• CPC Class Codes: C03C 2217/23 Mixtures
• CPC Class Codes: C03C 2217/71 Photocatalytic coatings
• CPC Class Codes: C03C 2217/91 Coatings containing at least one layer having a composition gradient through its thickness
• CPC Class Codes: C03C 2218/154 by sputtering
• CPC Class Codes: C23C 14/024 Deposition of sublayers, e.g. to promote adhesion of the coating C23C14/027 takes precedence
• CPC Class Codes: C23C 14/083 of refractory metals or yttrium
• CPC Class Codes: C23C 14/3464 using more than one target C23C14/56 takes precedence
• CPC Class Codes: C23C 14/352 using more than one target C23C14/56 takes precedence
• CPC Class Codes: Y10T 428/261 In terms of molecular thickness or light wave length
• CPC Class Codes: Y10T 428/265 1 mil or less
• CPC Class Codes: Y10T 428/31678 Of metal

Abstract

The invention provides a substrate bearing a low-maintenance coating. In some embodiments, the coating includes a low-maintenance film that includes both titanium oxide and tungsten oxide. The invention also provides methods and equipment for depositing such coatings.

Claims

1. A method of depositing of a low-maintenance coating on a major surface of a substrate, the low-maintenance coating including a base film and a functional film, the base film being deposited by a high-rate sputtering technique wherein at least one target is sputtered in an atmosphere into which both inert gas and reactive gas are flowed, wherein an inflow rate for the inert gas divided by an inflow rate for the reactive gas is between 0.4 and 9, the functional film being deposited by a high-rate sputtering technique that uses at least one target having a sputterable material comprising both titanium oxide and tungsten oxide.

2. The method of claim 1 wherein the high-rate sputtering technique for depositing the base film involves a plurality of targets each carrying a sputterable material consisting essentially of:

1) one or more metals, or

     2) one or more semi-metals, or

     3) at least one metal and at least one semi-metal, and the high-rate sputtering technique for depositing the functional film involves a plurality of oxide targets each carrying the sputterable material comprising both titanium oxide and tungsten oxide.

3. The substrate of claim 2 wherein the sputterable material used in depositing the base film includes silicon, and wherein the sputterable material used in depositing the functional film includes:

i) tungsten in oxide form, ii) TiO, and iii) TiO₂.

4. The method of claim 1 wherein the inert gas is argon and the reactive gas is oxygen or nitrogen.

5-12. -12. (canceled)