METHODS FOR CONSTRUCTING AN OPTIMAL ENDPOINT ALGORITHM
First Claim
1. A method for automatically identifying an optimal endpoint algorithm for qualifying a process endpoint during substrate processing within a plasma processing system, comprising:
- receiving sensor data from a plurality of sensors during substrate processing of at least one substrate within said plasma processing system, wherein said sensor data includes a plurality of signal streams from a plurality of sensor channels;
identifying an endpoint domain, wherein said endpoint domain is an approximate period within which said process endpoint is expected to occur;
analyzing said sensor data to generate a set of potential endpoint signatures;
converting said set of potential endpoint signatures into a set of optimal endpoint algorithms; and
importing one optimal endpoint algorithm of said set of optimal endpoint algorithms into production environment.
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Abstract
A method for automatically identifying an optimal endpoint algorithm for qualifying a process endpoint during substrate processing within a plasma processing system is provided. The method includes receiving sensor data from a plurality of sensors during substrate processing of at least one substrate within the plasma processing system, wherein the sensor data includes a plurality of signal streams from a plurality of sensor channels. The method also includes identifying an endpoint domain, wherein the endpoint domain is an approximate period within which the process endpoint is expected to occur. The method further includes analyzing the sensor data to generate a set of potential endpoint signatures. The method yet also includes converting the set of potential endpoint signatures into a set of optimal endpoint algorithms. The method yet further includes importing one optimal endpoint algorithm of the set of optimal endpoint algorithms into production environment.
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Citations
20 Claims
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1. A method for automatically identifying an optimal endpoint algorithm for qualifying a process endpoint during substrate processing within a plasma processing system, comprising:
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receiving sensor data from a plurality of sensors during substrate processing of at least one substrate within said plasma processing system, wherein said sensor data includes a plurality of signal streams from a plurality of sensor channels; identifying an endpoint domain, wherein said endpoint domain is an approximate period within which said process endpoint is expected to occur; analyzing said sensor data to generate a set of potential endpoint signatures; converting said set of potential endpoint signatures into a set of optimal endpoint algorithms; and importing one optimal endpoint algorithm of said set of optimal endpoint algorithms into production environment. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method for qualifying an endpoint during substrate processing within a processing chamber, comprising:
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executing a recipe on a substrate; receiving processing data from a set of sensors during substrate processing; analyzing said processing data by applying an optimal endpoint algorithm; identifying a process endpoint; and stopping said substrate processing. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification