METHODS AND ARRANGEMENTS FOR IN-SITU PROCESS MONITORING AND CONTROL FOR PLASMA PROCESSING TOOLS
First Claim
1. An arrangement for implementing an automatic in-situ process control scheme during execution of a recipe on a substrate within a processing chamber of a plasma processing system, comprising:
- a plurality of control-loop sensors configured at least for collecting a first set of sensor data to facilitate monitoring set points during said execution of said recipe, wherein said plurality of control-loop sensors being part of a process control loop;
a set of independent sensors configured at least for collecting a second set of sensor data, said set of independent sensors being not part of said process control loop;
a hub configured for at least receiving at least one of said first set of sensor data and said second set of sensor data;
an analysis computer communicably coupled with said hub and configured for performing analysis of at least one of said first set of sensor data and said second set of sensor data, wherein said analysis computer includes a high speed processor for analyzing a high volume of data.
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Abstract
An arrangement for implementing an automatic in-situ process control scheme during execution of a recipe is provided. The arrangement includes control-loop sensors configured at least for collecting a first set of sensor data to facilitate monitoring set points during the recipe execution, wherein the control-loop sensors being part of a process control loop. The arrangement also includes independent sensors configured at least for collecting a second set of sensor data, which is not part of the process control loop. The arrangement yet also includes a hub configured for at least receiving at least one of the first set of sensor data and the second set of sensor data. The arrangement yet further includes an analysis computer communicably coupled with the hub and configured for performing analysis of at least one of the first set of sensor data and the second set of sensor data.
81 Citations
20 Claims
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1. An arrangement for implementing an automatic in-situ process control scheme during execution of a recipe on a substrate within a processing chamber of a plasma processing system, comprising:
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a plurality of control-loop sensors configured at least for collecting a first set of sensor data to facilitate monitoring set points during said execution of said recipe, wherein said plurality of control-loop sensors being part of a process control loop; a set of independent sensors configured at least for collecting a second set of sensor data, said set of independent sensors being not part of said process control loop; a hub configured for at least receiving at least one of said first set of sensor data and said second set of sensor data; an analysis computer communicably coupled with said hub and configured for performing analysis of at least one of said first set of sensor data and said second set of sensor data, wherein said analysis computer includes a high speed processor for analyzing a high volume of data. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method for implementing an automatic in-situ process control scheme during execution of a recipe on a substrate within a processing chamber of a plasma processing system, comprising:
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retrieving said recipe for substrate processing of said substrate; providing sensor calibration data to an analysis computer, wherein said sensor calibration data includes an empirical relationship between a set of control-loop sensors and a set of independent sensors; tuning said recipe to a set of recipe set points; executing said recipe; receiving a first set of sensor data from said set of control-loop sensors and a second set of sensor data from said set of independent sensors; analyzing at least one of said first set of sensor data and said second set of sensor data to calculate a set of virtual measurements; comparing said set of virtual measurements to a predefined threshold; and if said set of virtual measurements is outside of said predefined threshold, generating at least one of a warning and an alarm. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification