METHODS AND APPARATUS TO PREDICT ETCH RATE UNIFORMITY FOR QUALIFICATION OF A PLASMA CHAMBER
First Claim
1. A method for predicting etch rate uniformity for qualifying health status of a processing chamber during substrate processing of a set of substrates, comprising:
- executing a recipe on a first substrate of said set of substrates;
receiving processing data from a first set of sensors during said executing of said recipe;
analyzing said processing data utilizing a subsystem health check predictive model to determine calculated data, said calculated data including at least one of etch rate data and uniformity data, wherein said subsystem health check predictive model is constructed by correlating a first set of data and a second set of data, said first set of data includes measurement data from a set of film substrates and said second set of data includes processing data collected during analogous processing of a set of non-film substrates;
performing a comparison of said calculated data of said first substrate against a set of control limits as defined by said subsystem health check predictive model; and
generating a warning if said calculated data is outside of said set of control limits.
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Abstract
A method for predicting etch rate uniformity for qualifying health status of a processing chamber during substrate processing of substrates is provided. The method includes executing a recipe and receiving processing data from a first set of sensors. The method further includes analyzing the processing data utilizing a subsystem health check predictive model to determine calculated data, which includes at least one of etch rate data and uniformity data. The subsystem health check predictive model is constructed by correlating measurement data from a set of film substrates with processing data collected during analogous processing of a set of non-film substrates. The method yet also includes performing a comparison of the calculated data against a set of control limits as defined by the subsystem health check predictive model. The method yet further includes generating a warning if the calculated data is outside of the set of control limits.
85 Citations
20 Claims
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1. A method for predicting etch rate uniformity for qualifying health status of a processing chamber during substrate processing of a set of substrates, comprising:
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executing a recipe on a first substrate of said set of substrates; receiving processing data from a first set of sensors during said executing of said recipe; analyzing said processing data utilizing a subsystem health check predictive model to determine calculated data, said calculated data including at least one of etch rate data and uniformity data, wherein said subsystem health check predictive model is constructed by correlating a first set of data and a second set of data, said first set of data includes measurement data from a set of film substrates and said second set of data includes processing data collected during analogous processing of a set of non-film substrates; performing a comparison of said calculated data of said first substrate against a set of control limits as defined by said subsystem health check predictive model; and generating a warning if said calculated data is outside of said set of control limits. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A processing chamber health check arrangement for qualifying a processing chamber of a plasma processing system, comprising:
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a pre-assessment module for determining the readiness of said processing chamber; a library for storing at least one of recipes and recipe parameters; and a subsystem health check predictive model configured for receiving processing data from a first set of sensors during substrate processing; analyzing said processing data to determine a set of calculated data, wherein said set of calculated data includes at least one of etch rate data and uniformity data; comparing said set of calculated data to a set of predefined control limits; and generating warning when said set of calculated data is outside of said set of predefined control limits. - View Dependent Claims (11, 12, 13, 14, 15)
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16. An article of manufacture comprising a program storage medium having computer readable code embodied therein, said computer readable code being configured for predicting etch rate uniformity for qualifying health status of a processing chamber during substrate processing of a set of substrates, comprising:
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code for executing a recipe on a first substrate of said set of substrates; code for receiving processing data from a first set of sensors during said executing of said recipe; code for analyzing said processing data utilizing a subsystem health check predictive model to determine calculated data, said calculated data including at least one of etch rate data and uniformity data, wherein said subsystem health check predictive model is constructed by correlating a first set of data and a second set of data, said first set of data includes measurement data from a set of film substrates and said second set of data includes processing data collected during analogous processing of a set of non-film substrates; code for comparing said calculated data of said first substrate against a set of control limits as defined by said subsystem health check predictive model; and code for generating a warning if said calculated data is outside of said set of control limits. - View Dependent Claims (17, 18, 19, 20)
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Specification