LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

• US 20110001942A1
• Filed: 02/02/2010
• Published: 01/06/2011
• Est. Priority Date: 11/12/2002
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Sengers, Timotheus Franciscus, Mulkens, Johannes Catharinus Hubertus, Butler, Erik Theodorus Maria, Donders, Sjoerd Nicolaas Lambertus, Staaijer, Alexander, Ritsema, Roelof Aeilko Siebrand, Kolesnychenko, Aleksey, Meijer, Hendricus Johannes Maria, Butler, Hans, Streefkerk, Bob, Van Schaik, Frank, De Smit, Joannes Theodoor, Loopstra, Erik Roelof, Mertens, Jeroen Johannes Sophia Maria, Lof, Joeri, Van Santen, Helmar, Simon, Klaus, Hoogendam, Christiaan Alexander
• Granted Patent: US 8,472,002 B2
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70866 of mask or workpiece

Abstract

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

Claims

1-51. -51. (canceled)

52. A lithographic projection apparatus comprising:

a substrate table which holds a substrate;

a projection system which projects a patterned beam onto a target portion of the substrate; and

a sensor capable of being positioned to be illuminated by the beam of radiation through a liquid, wherein

the substrate is projected by the patterned beam through a liquid which at least partly fills a space between the projection system and an object on the substrate table, and a surface of the sensor, a surface of the substrate, and a surface of the substrate table are substantially co-planar.

53. An apparatus according to claim 52, wherein the substrate table comprises a support surface which supports an intermediary plate between the projection system and the sensor and not in contact with the sensor.

54. An apparatus according to claim 53, wherein the substrate table comprises a transmission image sensor which senses the beam and wherein the intermediary plate is positionable between the sensor and the projection system.

55. An apparatus according to claim 52, wherein the sensor is on the substrate table.

56. An apparatus according to claim 52, wherein the sensor comprises an alignment sensor which aligns the substrate table relative to the projection system.

57. An apparatus according to claim 56, wherein measurement gratings of the alignment sensor have a pitch of less than 500 nm.

58. An apparatus according to claim 56, wherein the alignment sensor is illuminated obliquely.

59. An apparatus according to claim 52, wherein the sensor comprises a transmission image sensor.

60. An apparatus according to claim 52, wherein the sensor comprises a focus sensor.

61. An apparatus according to claim 52, wherein the sensor comprises a spot or dose sensor, an integrated lens interferometer and scanner, an alignment mark, or any combination of the foregoing.

62. An apparatus according to claim 52, wherein the substrate table comprises an edge seal member which at least partly surrounds an edge of the sensor and provides a primary surface facing the projection system substantially co-planar with a primary surface of the sensor.

63. A device manufacturing method comprising:

projecting a beam of radiation through a liquid onto a sensor; and

projecting the beam of radiation as patterned using a projection system of a lithographic apparatus through the liquid onto a target portion of a substrate that is held by a substrate table, wherein

a surface of the sensor, a surface of the substrate, and a surface of the substrate table are substantially co-planar.

64. A method according to claim 63, wherein the liquid is supported on an intermediary plate between the projection system and the sensor, the plate not being in contact with the sensor.

65. A method according to claim 64, wherein the sensor comprises a transmission image sensor which senses the beam and the intermediary plate is positionable between the sensor and the projection system.

66. A method according to claim 63, wherein the sensor is on the substrate table.

67. A method according to claim 63, wherein the sensor comprises an alignment sensor which aligns the substrate table relative to the projection system.

68. A method according to claim 67, wherein measurement gratings of the alignment sensor have a pitch of less than 500 nm.

69. A method according to claim 67, wherein the alignment sensor is illuminated obliquely.

70. A method according to claim 63, wherein the sensor comprises a transmission image sensor.

71. A method according to claim 63, wherein the sensor comprises a focus sensor.

72. A method according to claim 63, wherein the sensor comprises a spot or dose sensor, an integrated lens interferometer and scanner, an alignment mark, or any combination of the foregoing.

73. A method according to claim 63, wherein the substrate table comprises an edge seal member which at least partly surrounds an edge of the sensor and provides a primary surface facing the projection system substantially co-planar with a primary surface of the sensor.

74. An exposure apparatus that exposes a substrate by irradiating an exposure beam onto the substrate via a liquid, comprising:

an optical member that irradiates the exposure beam; and

a substrate stage that holds the substrate and has at least one sensor, wherein a surface of the at least one sensor, a top surface of the substrate stage, and a surface of the substrate held by the substrate stage form one flat surface, wherein an immersion area is located by filling a space between a surface of the substrate and the optical member with a liquid, the immersion area is smaller than the surface of the substrate.

75. The exposure apparatus of claim 74, wherein the immersion area is movable on the one flat surface by moving the substrate stage relative to the optical member.

76. The exposure apparatus of claim 74, wherein the at least one sensor is viewed through a liquid.

77. The exposure apparatus of claim 76, wherein the at least one sensor is viewed through the optical member with a liquid.

78. The exposure apparatus of claim 74, wherein the top surface is arranged around the surface of the substrate held by the substrate stage and the surface of the at least one sensor.

79. The exposure apparatus of claim 74, wherein the at least one sensor is disposed on the substrate stage.

80. The exposure apparatus of claim 74, wherein the substrate stage further has a fiducial mark, the fiducial mark having a top surface, the top surface of the fiducial mark being included in the one flat surface.

81. The exposure apparatus of claim 74, wherein the substrate stage comprises at least one portion in which the at least one sensor is arranged.

82. The exposure apparatus of claim 74, further comprising:

a position detecting device that obtains information regarding a position of the substrate stage by irradiating a measuring beam to a measuring portion disposed on the substrate stage, an upper side of the measuring portion is arranged to be included on the one flat surface.

83. The exposure apparatus of claim 74, wherein the substrate stage comprises at least one portion in which the substrate is arranged.

84. The exposure apparatus of claim 74, wherein the substrate stage comprises a first portion in which the substrate is arranged and a second portion in which the at least one sensor is arranged.

85. The exposure apparatus of claim 74, wherein the substrate stage has a substrate holder.

86. An exposure apparatus that exposes a substrate by irradiating an exposure beam onto the substrate via a liquid, comprising:

optical means for irradiating the exposure beam; and

holding means for holding the substrate, the holding means has at least one sensing means, the holding means being movable relative to the optical means, wherein a surface of the at least one sensing means, a top surface of the holding means, and a surface of the substrate held by the holding means form one flat surface, and an immersion area is located by filling a space between a surface of the substrate and the optical means with a liquid, the immersion area is smaller than the surface of the substrate.

87. An exposure method comprising:

holding a substrate with a substrate stage that has at least one sensor, a surface of the at least one sensor, a top surface of the substrate stage, and a surface of the substrate form one flat surface;

filling a space between a surface of the substrate and an optical member with a liquid; and

exposing the substrate held by the substrate stage by using the optical member through the liquid.

88. The exposure method of claim 87, wherein an immersion area is smaller than the surface of the substrate.

89. The exposure method of claim 88, wherein the immersion area is movable on the one flat surface by moving the substrate stage relative to the optical member.

90. The exposure method of claim 87, wherein the at least one sensor is viewed through a liquid.

91. The exposure method of claim 90, wherein the at least one sensor is viewed through the optical member with a liquid.

92. The exposure method of claim 87, wherein the top surface is arranged around the surface of the substrate held by the substrate stage and the surface of the at least one sensor.

93. The exposure method of claim 87, wherein the at least one sensor is disposed on the substrate stage.

94. The exposure method of claim 87, wherein the substrate stage comprises at least one portion in which the at least one sensor is arranged.

95. The exposure method of claim 87, further comprising:

providing a position detecting device that obtains information regarding a position of the substrate stage by irradiating a measuring beam to a measuring portion disposed on the substrate stage, an upper side of the measuring portion is arranged to be included on the one flat surface.

96. The exposure method of claim 87, wherein the substrate stage comprises at least one portion in which the substrate is arranged.

97. The exposure method of claim 87, wherein the substrate stage comprises a first portion in which the substrate is arranged and a second portion in which the at least one sensor is arranged.

98. The exposure method of claim 87, wherein the substrate stage has a substrate holder.

99. A method for manufacturing a device comprising:

exposing a substrate by using the exposure method defined in claim 87; and

developing the exposed substrate to manufacture the device.

100. A lithographic projection apparatus comprising:

a substrate table which holds a substrate; and

a projection system which projects a patterned beam onto a target portion of the substrate, wherein

the substrate is projected by the patterned beam through a liquid which at least partly fills a space between the projection system and an object on the substrate table, and a surface of the substrate and a surface of the substrate table are substantially co-planar.

101. An apparatus according to claim 100, further comprising a sensor capable of being positioned to be illuminated by the beam of radiation through a liquid and wherein a surface of the sensor and the surface of the substrate table are substantially co-planar.

102. An apparatus according to claim 101, wherein the substrate table comprises a support surface which supports an intermediary plate between the projection system and the sensor and not in contact with the sensor.

103. An apparatus according to claim 101, wherein the sensor is on the substrate table.

104. An apparatus according to claim 101, wherein the sensor comprises an alignment sensor which aligns the substrate table relative to the projection system.

105. An apparatus according to claim 100, further comprising an alignment mark capable of being positioned to be illuminated by the beam of radiation through a liquid and wherein a surface of the alignment mark and the surface of the substrate table are substantially co-planar.

106. An apparatus according to claim 100, wherein the substrate table comprises an edge seal member which at least partly surrounds an edge of the sensor and provides a primary surface facing the projection system substantially co-planar with a primary surface of the sensor.

107. A device manufacturing method comprising:

projecting a beam of radiation as patterned using a projection system of a lithographic apparatus through a liquid onto a target portion of a substrate that is held by a substrate table,

wherein a surface of the substrate and a surface of the substrate table are substantially co-planar.

108. A method according to claim 107, further comprising projecting a beam of radiation through the liquid onto a sensor, wherein a surface of the sensor and the surface of the substrate table are substantially co-planar.

109. A method according to claim 108, wherein the liquid is supported on an intermediary plate between the projection system and the sensor, the plate not being in contact with the sensor.

110. A method according to claim 108, wherein the substrate table comprises an edge seal member which at least partly surrounds an edge of the sensor and provides a primary surface facing the projection system substantially co-planar with a primary surface of the sensor.

111. An exposure apparatus that exposes a substrate by irradiating an exposure beam onto the substrate via a liquid, comprising:

an optical member that irradiates the exposure beam; and

a substrate stage that holds the substrate, wherein a top surface of the substrate stage and a surface of the substrate held by the substrate stage form one flat surface, wherein an immersion area is located by filling a space between a surface of the substrate and the optical member with a liquid, the immersion area is smaller than the surface of the substrate.

112. The exposure apparatus of claim 111, wherein the immersion area is movable on the one flat surface by moving the substrate stage relative to the optical member.

113. The exposure apparatus of claim 111, wherein the top surface is arranged around the surface of the substrate held by the substrate stage.

114. The exposure apparatus of claim 111, wherein the substrate stage has at least one sensor, and a surface of the at least one sensor and the top surface of the substrate stage form one flat surface.

115. The exposure apparatus of claim 114, wherein the at least one sensor is viewed through a liquid.

116. The exposure apparatus of claim 115, wherein the at least one sensor is viewed through the optical member with a liquid.

117. The exposure apparatus of claim 114, wherein the top surface is arranged around the surface of the at least one sensor.

118. The exposure apparatus of claim 114, wherein the at least one sensor is disposed on the substrate stage.

119. The exposure apparatus of claim 111, wherein the substrate stage further has a fiducial mark, the fiducial mark having a top surface, the top surface of the fiducial mark being included in the one flat surface.

120. An exposure apparatus that exposes a substrate by irradiating an exposure beam onto the substrate via a liquid, comprising:

optical means for irradiating the exposure beam; and

holding means for holding the substrate, the holding means being movable relative to the optical means, wherein a top surface of the holding means and a surface of the substrate held by the holding means form one flat surface, and an immersion area is located by filling a space between a surface of the substrate and the optical means with a liquid, the immersion area is smaller than the surface of the substrate.

121. The exposure apparatus of claim 120, wherein the holding means has at least one sensing means, and wherein a surface of the at least one sensing means and the top surface of the holding means form one flat surface.

122. An exposure method comprising:

holding a substrate with a substrate stage, a top surface of the substrate stage and a surface of the substrate form one flat surface;

filling a space between a surface of the substrate and an optical member with a liquid; and

exposing the substrate held by the substrate stage by using the optical member through the liquid.

123. The exposure method of claim 122, wherein an immersion area is smaller than the surface of the substrate.

124. The exposure method of claim 123, wherein the immersion area is movable on the one flat surface by moving the substrate stage relative to the optical member.

125. The exposure method of claim 122, wherein the top surface is arranged around the surface of the substrate held by the substrate stage.

126. The exposure method of claim 122, wherein the substrate stage has at least one sensor, and a surface of the at least one sensor and the top surface of the substrate stage form one flat surface.

127. The exposure method of claim 126, wherein the at least one sensor is viewed through a liquid.

128. The exposure method of claim 127, wherein the at least one sensor is viewed through the optical member with a liquid.

129. The exposure method of claim 126, wherein the top surface is arranged around the surface of the at least one sensor.

130. The exposure method of claim 126, wherein the at least one sensor is disposed on the substrate stage.

131. A lithographic projection apparatus comprising:

a projection system configured to project a patterned beam of radiation onto a target portion of a substrate;

a substrate table configured to hold the substrate, the substrate table comprising;

an edge seal member configured to at least partly surround an edge of the substrate, an object positioned on the substrate table, or both, and

a vacuum port, a liquid supply port, or both, positioned to provide respectively vacuum or liquid to the gap between the edge seal member and the substrate, the object, or both, on a side opposite the projection system; and

a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the substrate, the object, or both.

132. The apparatus according to claim 131, wherein the substrate table further comprises a channel positioned radially inwardly of the vacuum port, the channel being connected to a gas source such that on actuation of the vacuum a flow of gas radially outwardly from the channel towards the vacuum can be established.

133. The apparatus according to claim 132, wherein one or more burls configured to be in contact with the substrate, the object, or both, are present radially outwardly of the channel and inwardly of the vacuum port.

134. The apparatus according to claim 131, wherein the substrate table comprises a portion which extends below the substrate, the object, or both, and is radially outwardly of the vacuum port.

135. The apparatus according to claim 134, wherein the portion has one or more parts which extend up to the substrate, the object, or both, to at least partly support the substrate, the object, or both.

136. The apparatus according to claim 134, wherein the portion is part of a pimple table which supports the substrate.

137. The apparatus according to claim 131, further comprising a compartment in the substrate table in fluid connection with the gap via the vacuum port and with the vacuum.

138. The apparatus according to claim 131, wherein the vacuum port is annular.

139. The apparatus according to claim 131, wherein the vacuum port is discontinuous.

141. The apparatus according to claim 131, wherein the vacuum port is positioned adjacent an edge portion of the edge seal member.

142. The apparatus according to claim 131, wherein the object comprises a sensor.

143. The apparatus according to claim 131, wherein the edge seal member is glued to the substrate, the object, or both, around a periphery of the substrate, the object, or both.

144. A lithographic projection apparatus comprising:

a projection system configured to project a patterned beam of radiation onto a target portion of a substrate;

a substrate table configured to hold the substrate, the substrate table comprising an edge seal member configured to at least partly surround an edge of a substrate, an object, or both, positioned on the substrate table and to provide a primary surface facing the projection system substantially co-planar with a primary surface of the substrate, the object, or both; and

a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the substrate, the object, or both, and to a localized area of (i) the object, (ii) the edge seal member, (iii) the substrate, or (iv) any combination of (i)-(iii).

145. The apparatus according to claim 144, wherein the edge seal member and the substrate, the object, or both, are moveably mounted relative to one another.

146. The apparatus according to claim 144, wherein the edge seal member is moveable in a plane substantially parallel to the primary surface of the edge seal member to vary the distance between the edge seal member and the substrate, the object, or both.

147. The apparatus according to claim 144, wherein the substrate table comprises an actuator configured to move the edge seal member relative to a remainder of the substrate table in a direction substantially parallel to the optical axis of the apparatus.

148. The apparatus according to claim 147, wherein the actuator comprises a wedge member which, on movement in a direction substantially parallel to the primary surface of the edge seal member, is effective to move the edge seal member relative to a remainder of the substrate table in the direction substantially parallel to the optical axis of the apparatus.

149. The apparatus according to claim 148, wherein the wedge is configured to lock in place on removal of an actuation force by virtue of the coefficient of friction of the wedge.

150. The apparatus according to claim 144, wherein the substrate table comprises a hydrophobic layer adjacent an edge portion of the edge seal member and the substrate, the object, or both, on an opposite side of the edge seal member and the substrate, the object, or both, to the projection system.

151. The apparatus according to claim 150, wherein the liquid has a contact angle of greater than 90°

with the hydrophobic layer.

152. The apparatus according to claim 144, wherein the edge seal member has a projection with a top surface co-planar with the primary surface of the edge seal member and extending towards the optical axis of the apparatus.

153. The apparatus according to claim 144, wherein the substrate table comprises a gap seal member configured to abut or at least partly overlap, in the direction of the optical axis, both the edge seal member and the substrate, the object, or both.

154. The apparatus according to claim 153, wherein the gap seal member is configured to be in contact with the primary surfaces thereby spanning a gap between the edge seal member and the substrate, the object, or both.

155. The apparatus according to claim 153, wherein the gap seal member has inner and outer edges at least one of which edges is tapered such that the distance of the surface of the gap seal member facing away from the primary surface of the edge seal member or the substrate, the object, or both, decreases towards he edge of the gap seal member.

156. The apparatus according to claim 153, wherein the substrate table comprises a vacuum port in the primary surface of the edge seal member configured to hold the gap seal member in place.

157. The apparatus according to claim 144, wherein the substrate table comprises an actuator configured to vary the distance of the primary surface of the substrate, the object, or both, relative to the remainder of the substrate table.

158. The apparatus according to claim 144, wherein the object comprises a sensor.

159. The apparatus according to claim 144, wherein the edge seal member is glued to the substrate, the object, or both, around a periphery of the substrate, the object, or both.

160. A lithographic projection apparatus comprising:

a projection system configured to project a patterned beam of radiation onto a target portion of a substrate;

a substrate table configured to hold the substrate, the substrate table comprising;

an edge seal member configured to at least partly surround an edge of a substrate, an object, or both, positioned on the substrate table, and

a further edge seal member configured to extend across the gap between the edge seal member and the substrate, the object, or both, and to be in contact with the substrate, the object, or both; and

a liquid supply system configured provide a liquid, through which the beam is to be projected, in a space between the projection system and the substrate, the object, or both.

161. The apparatus according to claim 160, re further edge seal member is flexible.

162. The apparatus according to claim 161, wherein the flexible further edge seal member is attached to the edge seal member.

163. The apparatus according to claim 161, wherein the flexible further edge seal member has a port, connected to a vacuum source, adjacent its end distal from the edge seal member, such that on actuation of the vacuum source, the flexible further edge seal member is deflectable upwards to contact against the substrate, the object, or both, to form a seal between the flexible further edge seal member and the substrate, the object, or both, due to the force generated by the vacuum source acting on the substrate, the object, or both.

164. The apparatus according to claim 161, further comprising a second flexible further edge seal member attached under the substrate, the object, or both, to the substrate table and with a free end radially outwardly from the attachment point.

165. The apparatus according to claim 161, wherein the flexible further edge seal member is disposed between the edge seal member and the substrate, the object, or both, and with a surface substantially co-planar with the primary surfaces of the edge seal member and the substrate, the object, or both.

166. The apparatus according to claim 165, wherein the flexible further edge seal member is shaped to contact the substrate, the object, or both, on a surface opposite its primary surface.

167. The apparatus according to claim 165, wherein the flexible further edge seal member is effective to apply a force to the substrate, the object, or both, away from the substrate table when the substrate, the object, or both, is held on the substrate table.

168. The apparatus according to claim 160, wherein the object comprises a sensor.

169. The apparatus according to claim 160, wherein the edge seal member, the further edge seal member, or both, is glued to the substrate, the object, or both, around a periphery of the substrate, the object, or both.

170. A lithographic projection apparatus comprising:

a projection system configured to project a patterned beam of radiation onto a target portion of a substrate;

a substrate table configured to hold the substrate, the substrate table comprising a support surface configured to support an intermediary plate between the projection system and a substrate and an object positioned on the substrate table and not in contact with the substrate, the object, or both; and

a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the substrate, the object, or both.

171. The apparatus according to claim 170, wherein the liquid supply system includes a liquid supply port configured to provide a liquid to a space between the intermediary plate and the substrate, the object, or both.

172. The apparatus according to claim 170, wherein the substrate table comprises a transmission image sensor configured to sense a beam and wherein the intermediary plate is positionable between the sensor and the projection system.

173. The apparatus according to claim 170, wherein the liquid supply system comprises a projection system liquid supply system configured to provide a liquid in a space between the projection system and the intermediary plate.

174. The apparatus according to claim 170, wherein the intermediary plate has a cross sectional area in a plane perpendicular to the optical axis of the apparatus greater than that of an object positioned on the substrate table such that all the edges of the substrate, the object, or both, can be covered by the intermediary plate.

175. The apparatus according to claim 170, wherein the object comprises a sensor.

176. A lithographic projection apparatus comprising:

a projection system configured to project a patterned beam of radiation onto a target portion of a substrate;

a substrate table configured to hold the substrate; and

a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and a substrate, an object, or both, positioned on the substrate table, wherein a structure of the liquid supply system extends along at least part of the boundary of the space between the projection system and the substrate table and capillaries extend away from the substrate table and are positioned between the structure and the projection system.

177. The apparatus according to claim 176, wherein the capillaries comprise tubes.

178. The apparatus according to claim 177, wherein the capillaries comprise a porous membrane.

179. The apparatus according to claim 176, wherein the capillaries comprise an inner hydrophobic coating.

180. The apparatus according to claim 176, comprising an electric device configured to apply a potential difference between the liquid in the space and the capillaries.

181. The apparatus according to claim 176, wherein the object comprises a sensor.