Controlling gas partial pressures for process optimization

• US 20110005607A1
• Filed: 08/03/2010
• Published: 01/13/2011
• Est. Priority Date: 12/03/2004
• Status: Active Grant

• Current Assignee: Jean-Pierre Desbiolles, Michel Puech
• Original Assignee: Jean-Pierre Desbiolles, Michel Puech
• Inventors: Puech, Michel, Desbiolles, Jean-Pierre
• Granted Patent: US 8,297,311 B2
• Time in Patent Office: Days
• US Class Current: 137/14
• CPC Class Codes: F04D 19/04 specially adapted to the production of a high vacuum, e.g. molecular pumps
• CPC Class Codes: F04D 27/00 Control, e.g. regulation, of pumps, pumping installations or pumping systems specially adapted for elastic fluids
• CPC Class Codes: Y10T 137/0396 Involving pressure control
• CPC Class Codes: Y10T 137/86002 Fluid pressure responsive
• CPC Class Codes: Y10T 137/86083 Vacuum pump
• CPC Class Codes: Y10T 137/86139 Serial
• CPC Class Codes: Y10T 137/87917 Flow path with serial valves and/or closures

Abstract

Apparatus for establishing and controlling a low pressure gas mixture in a vacuum enclosure (8) comprises at least one secondary pump (9) of the molecular, turbomolecular, or hybrid type, followed by at least one primary pump (10), with first control and adjustment means (22) such as a regulation valve (24) for controlling and adjusting the total gas pressure of the mixture of gases in the vacuum enclosure (8) as a function of a total pressure setpoint (27). The apparatus further comprises second control and adjustment means (28) such as a second regulation valve (29a) downstream from the secondary pump (9). The second regulation valve (29a) is controlled as a function of a delivery pressure setpoint (32) to modify the delivery pressure of the secondary pump (9) and thus to adapt its pumping capacity in selective manner. This makes it possible to adjust the proportions of the gases in the mixture of gases in the vacuum enclosure, independently of the total pressure which is controlled by the first regulation valve (24).

Claims

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20. An apparatus for establishing and controlling a low pressure mixture of gases in a vacuum enclosure, the apparatus comprising:

a primary pump adapted to deliver to atmospheric pressure;

a secondary pump of a molecular, turbomolecular, or hybrid type, said secondary pump pumping from the vacuum enclosure to the primary pump, to evacuate gases from the enclosure;

an intermediate pipe interconnecting the delivery outlet of the secondary pump and a suction inlet of the primary pump;

first control and adjustment means, disposed upstream from the secondary pump, for controlling and adjusting the total gas pressure of the mixture of gases in the vacuum enclosure as a function of a total pressure setpoint; and

second control and adjustment means disposed downstream from the secondary pump, including

means for acting on the delivery pressure from the secondary pump in the range of pressures in which changes of the delivery pressure lead to significant variations in the pumping speeds of different gases of the mixture in a manner that is selective depending on the nature of the gases and

means for acting on the delivery pressure in response to a delivery pressure setpoint to adapt the pumping capacity of the secondary pump to selectively pump different gases at different speeds to favor pumping a selected one of the gases from the vacuum enclosure by the secondary pump, to adjust the proportions and the partial pressures of the gases in the mixture of gases in the vacuum enclosure.

21. Apparatus according to claim 20, in which the first control and adjustment means includes a regulation valve interposed between the vacuum enclosure and the secondary pump.

22. Apparatus according to claim 20, in which the second control and adjustment means comprises a regulation valve interposed between the secondary and primary pumps.

23. Apparatus according to claim 20, wherein the second control and adjustment means comprises a gas injection device for injecting an inert gas into the intermediate pipe.

24. Apparatus according to claim 20, in which the second control and adjustment means comprises speed control means for controlling the speed of the primary pump.

25. Apparatus according to claim 20, in which the first control and adjustment means includes means for controlled injection of gas into the vacuum enclosure.

27. Apparatus according to claim 20, including a control unit controlling the second control and adjustment means in application of a specific program for adapting the pumping capacity of the secondary pump selectively to the various successive steps of a treatment process taking place in the vacuum enclosure.

28. A method of establishing and controlling a low pressure mixture of gases in a vacuum enclosure using apparatus according to claim 20, by acting on the delivery pressure of the secondary pump to adapt its pumping capacity selectively, thereby adjusting the proportions of the gases in the gas mixture.

29. A method according to claim 28, in which action is taken on the delivery pressure by modifying the conduction of the intermediate pipe.

30. A method according to claim 28;

in which action is taken on the delivery pressure by injecting an inert gas into the intermediate pipe.

31. A method according to claim 28, in which action is taken on the delivery pressure by modifying the speed of the primary pump.

32. A method according to claim 28, in which action is taken on the delivery pressure of the secondary pump as a function of successive steps in a treatment process taking place in the vacuum enclosure.

33. A method according to claim 28, in which action is taken on the delivery pressure of the secondary pump in the direction appropriate for increasing the pumping of moisture during a process of controlled evacuation of the vacuum enclosure.

34. A method according to claim 28, in which action is taken on the delivery pressure of the secondary pump in the direction appropriate for keeping the partial pressure of at least one gas in the vacuum enclosure constant.

35. A method according to claim 28, further comprising the step of compensating for variations in the pumping characteristics of the secondary pump.

36. A method according to claim 28, further comprising the step of compensating for drift while pumping gas from the enclosure.

37. A method according to claim 28, further comprising the step of increasing a delivery pressure of the secondary pump, wherein the speed of a dry etching process is increased by increasing the delivery pressure.

38. A method according to claim 28, further comprising the step of controlling the quality of chemical vapor deposition (CVD) using the delivery pressure of the secondary pump.

26. A vacuum enclosure adapted and constructed to perform a treatment process comprising:

means for changing the pressure and mixture of gases contained within the vacuum enclosure during the treatment process based on pressure setpoints, wherein the pressure setpoints change based on the treatment process during the course of the treatment process, operatively connected to the vacuum enclosure.

39. A control unit for an apparatus that controls a mixture of gases in a vacuum enclosure, which apparatus includes a primary pump adapted to deliver to atmospheric pressure, a secondary pump of a molecular, turbomolecular, or hybrid type, said secondary pump pumping from the vacuum enclosure to the primary pump to evacuate gases from the enclosure, first control and adjustment means upstream from the secondary pump controlling the total gas pressure in the vacuum enclosure, and second control and adjustment means disposed downstream from the secondary pump to act on the delivery pressure of the secondary pump, the control unit comprising:

means for successively providing each of plural delivery pressure setpoints to the second control and adjustment means in application of a program of successive steps of a treatment process taking place in the vacuum enclosure, causing the second control and adjustment means to act on the delivery pressure of the secondary pump to drive the delivery pressure thereof toward said each of the setpoints, including

means for generating a predetermined setpoint for said delivery pressure, at a selected step in the treatment process in which a first and a second gas of the mixture are to be evacuated from the vacuum chamber, with the second gas being evacuated at a speed higher than the first gas is evacuated and

means for providing the predetermined delivery pressure setpoint to the second control and adjustment means, the predetermined setpoint selected to cause the secondary pump to operate at a delivery pressure at which the secondary pump pumps the first gas from the vacuum enclosure at a first selected speed and pumps the second gas at a second selected speed greater than the first speed, thereby evacuating the second gas at a higher speed, as specified for the selected step in the treatment process.

whereby said control unit enables the apparatus to act on the proportions and thereby the partial pressures of gases in the mixture of gases in the vacuum enclosure.