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PLASMA PROCESSING CHAMBER WITH ENHANCED GAS DELIVERY

  • US 20110006038A1
  • Filed: 07/13/2009
  • Published: 01/13/2011
  • Est. Priority Date: 07/13/2009
  • Status: Active Grant
First Claim
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1. A vacuum processing chamber, comprising:

  • a chamber body having an interior volume;

    a substrate support pedestal disposed in the interior volume;

    a lid enclosing the interior volume;

    a gas distribution plate positioned below the lid and above the substrate support pedestal; and

    a vortex inducing gas inlet oriented to induce a vortex of gas circulating in a plenum around a center line of the chamber body prior to the gas passing through the gas distribution plate.

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