SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THE SAME
First Claim
1. A semiconductor device comprising:
- a gate electrode layer over a substrate having an insulating surface;
a gate insulating layer over the gate electrode layer;
an oxide semiconductor layer over the gate insulating layer;
a connection layer over the gate insulating layer;
a source electrode layer and a drain electrode layer over the oxide semiconductor layer;
an insulating film covering the gate insulating layer, the oxide semiconductor layer, the source electrode layer, the drain electrode layer, and the connection layer; and
a first gate wiring, a second gate wiring, and a source wiring over the insulating film,wherein the source wiring is electrically connected to the source electrode layer,wherein the first gate wiring is electrically connected to the gate electrode layer,wherein the first gate wiring is electrically connected to the second gate wiring through the connection layer, andwherein the connection layer overlaps the source wiring.
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Accused Products
Abstract
An object is to manufacture and provide a highly reliable semiconductor device including a thin film transistor with stable electric characteristics. In a method for manufacturing a semiconductor device including a thin film transistor in which a semiconductor layer including a channel formation region serves as an oxide semiconductor film, heat treatment for reducing impurities such as moisture (heat treatment for dehydration or dehydrogenation) is performed after an oxide insulating film serving as a protective film is formed in contact with an oxide semiconductor layer. Then, the impurities such as moisture, which exist not only in a source electrode layer, in a drain electrode layer, in a gate insulating layer, and in the oxide semiconductor layer but also at interfaces between the oxide semiconductor film and upper and lower films which are in contact with the oxide semiconductor layer, are reduced.
165 Citations
46 Claims
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1. A semiconductor device comprising:
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a gate electrode layer over a substrate having an insulating surface; a gate insulating layer over the gate electrode layer; an oxide semiconductor layer over the gate insulating layer; a connection layer over the gate insulating layer; a source electrode layer and a drain electrode layer over the oxide semiconductor layer; an insulating film covering the gate insulating layer, the oxide semiconductor layer, the source electrode layer, the drain electrode layer, and the connection layer; and a first gate wiring, a second gate wiring, and a source wiring over the insulating film, wherein the source wiring is electrically connected to the source electrode layer, wherein the first gate wiring is electrically connected to the gate electrode layer, wherein the first gate wiring is electrically connected to the second gate wiring through the connection layer, and wherein the connection layer overlaps the source wiring. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A semiconductor device comprising:
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a gate electrode layer over a substrate having an insulating surface; a connection layer over the substrate having the insulating surface; a gate insulating layer over the gate electrode layer and the connection layer; an oxide semiconductor layer over the gate insulating layer; a source electrode layer and a drain electrode layer over the oxide semiconductor layer; an insulating film covering the gate insulating layer, the oxide semiconductor layer, the source electrode layer, and the drain electrode layer; and a first gate wiring, a second gate wiring, and a source wiring over the insulating film, wherein the source wiring is electrically connected to the source electrode layer, wherein the first gate wiring is electrically connected to the gate electrode layer, wherein the first gate wiring is electrically connected to the second gate wiring through the connection layer, and wherein the connection layer overlaps the source wiring. - View Dependent Claims (8, 9, 10, 11, 12)
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13. A semiconductor device comprising:
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a gate electrode layer over a substrate having an insulating surface; a gate insulating layer over the gate electrode layer; an oxide semiconductor layer over the gate insulating layer; a connection layer over the gate insulating layer; a source electrode layer and a drain electrode layer over the oxide semiconductor layer; an insulating film covering the gate insulating layer, the oxide semiconductor layer, the source electrode layer, the drain electrode layer, and the connection layer; and a gate wiring, a first source wiring, and a second source wiring over the insulating film, wherein the first source wiring is electrically connected to the source electrode layer, wherein the gate wiring is electrically connected to the gate electrode layer, wherein the first source wiring is electrically connected to the second source wiring through the connection layer, and wherein the connection layer overlaps the gate wiring. - View Dependent Claims (14, 15, 16, 17, 18)
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19. A semiconductor device comprising:
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a gate electrode layer over a substrate having an insulating surface; a connection layer over the substrate having the insulating surface; a gate insulating layer over the gate electrode layer and the connection layer; an oxide semiconductor layer over the gate insulating layer; a source electrode layer and a drain electrode layer over the oxide semiconductor layer; an insulating film covering the gate insulating layer, the oxide semiconductor layer, the source electrode layer, and the drain electrode layer; and a gate wiring, a first source wiring, and a second source wiring over the insulating film, wherein the first source wiring is electrically connected to the source electrode layer, wherein the gate wiring is electrically connected to the gate electrode layer, wherein the first source wiring is electrically connected to the second source wiring through the connection layer, and wherein the connection layer overlaps the gate wiring. - View Dependent Claims (20, 21, 22, 23, 24)
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25. A method for manufacturing a semiconductor device, comprising the steps of:
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forming a gate electrode layer including a first heat resistant conductive material over a substrate having an insulating surface; forming a gate insulating layer over the gate electrode layer; forming an oxide semiconductor layer over the gate insulating layer; forming a connection layer, a source electrode layer, and a drain electrode layer each including a second heat resistant conductive material over the gate insulating layer; forming, over the gate insulating layer, the oxide semiconductor layer, the connection layer, the source electrode layer, and the drain electrode layer, an insulating film which is in contact with part of the oxide semiconductor layer; and performing dehydration or dehydrogenation on the oxide semiconductor layer after forming the insulating film. - View Dependent Claims (26, 27, 28, 29, 30)
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31. A method for manufacturing a semiconductor device, comprising the steps of:
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forming a gate electrode layer including a first heat resistant conductive material over a substrate having an insulating surface; forming a gate insulating layer over the gate electrode layer; forming an oxide semiconductor layer over the gate insulating layer; forming a connection layer, a source electrode layer, and a drain electrode layer each including a second heat resistant conductive material over the gate insulating layer; forming, over the gate insulating layer, the oxide semiconductor layer, the connection layer, the source electrode layer, and the drain electrode layer, an insulating film which is in contact with part of the oxide semiconductor layer; performing dehydration or dehydrogenation on the oxide semiconductor layer after forming the insulating film; removing part of the insulating film and forming a first contact hole which reaches the source electrode layer, and a third contact hole and a fourth contact hole which reach both end portions of the connection layer; removing part of the insulating film and part of the gate insulating layer, and forming a second contact hole which reaches the gate electrode layer; and forming, over the insulating film, a source wiring which is connected to the source electrode layer through the first contact hole, a first gate wiring which is connected to the gate electrode layer through the second contact hole and to the connection layer through the third contact hole, and a second gate wiring which is connected to the connection layer through the fourth contact hole. - View Dependent Claims (32, 33, 34, 35, 36, 37, 38)
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39. A method for manufacturing a semiconductor device, comprising the steps of:
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forming a gate electrode layer including a first heat resistant conductive material over a substrate having an insulating surface; forming a gate insulating layer over the gate electrode layer; forming an oxide semiconductor layer over the gate insulating layer; forming a connection layer, a source electrode layer, and a drain electrode layer each including a second heat resistant conductive material over the oxide semiconductor layer; forming, over the gate insulating layer, the oxide semiconductor layer, the connection layer, the source electrode layer, and the drain electrode layer, an oxide insulating film which is in contact with part of the oxide semiconductor layer; performing dehydration or dehydrogenation on the oxide semiconductor layer after the oxide insulating film is formed; removing part of the oxide insulating film and forming a first contact hole which reaches the source electrode layer, and a third contact hole and a fourth contact hole which reach both end portions of the connection layer; removing part of the oxide insulating film and part of the gate insulating layer, and forming a second contact hole which reaches the gate electrode layer; and forming, over the oxide insulating film, a first source wiring which is connected to the source electrode layer through the first contact hole and to the connection layer through the third contact hole, a second source wiring which is connected to the connection layer through the fourth contact hole, and a gate wiring which is connected to the gate electrode layer through the second contact hole. - View Dependent Claims (40, 41, 42, 43, 44, 45, 46)
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Specification