METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
First Claim
1. A method for manufacturing a semiconductor device, comprising:
- forming a gate electrode layer over a substrate having an insulating surface;
forming a gate insulating layer over the gate electrode layer;
forming an oxide semiconductor layer over the gate insulating layer;
heating the oxide semiconductor layer in an oxygen atmosphere;
forming a source and drain electrode layers over the oxide semiconductor layer;
forming an oxide insulating layer which is in contact with part of the oxide semiconductor layer, over the gate insulating layer, the oxide semiconductor layer, and the source and drain electrode layers; and
performing a heat treatment in an oxygen atmosphere or an inert gas atmosphere.
1 Assignment
0 Petitions
Accused Products
Abstract
A highly reliable semiconductor device which includes a thin film transistor having stable electric characteristics, and a manufacturing method thereof. In the manufacturing method of the semiconductor device which includes a thin film transistor where a semiconductor layer including a channel formation region is an oxide semiconductor layer, heat treatment which reduces impurities such as moisture to improve the purity of the oxide semiconductor layer and oxidize the oxide semiconductor layer (heat treatment for dehydration or dehydrogenation) is performed. Not only impurities such as moisture in the oxide semiconductor layer but also those existing in a gate insulating layer are reduced, and impurities such as moisture existing in interfaces between the oxide semiconductor layer and films provided over and under and in contact with the oxide semiconductor layer are reduced.
-
Citations
7 Claims
-
1. A method for manufacturing a semiconductor device, comprising:
-
forming a gate electrode layer over a substrate having an insulating surface; forming a gate insulating layer over the gate electrode layer; forming an oxide semiconductor layer over the gate insulating layer; heating the oxide semiconductor layer in an oxygen atmosphere; forming a source and drain electrode layers over the oxide semiconductor layer; forming an oxide insulating layer which is in contact with part of the oxide semiconductor layer, over the gate insulating layer, the oxide semiconductor layer, and the source and drain electrode layers; and performing a heat treatment in an oxygen atmosphere or an inert gas atmosphere. - View Dependent Claims (5, 6, 7)
-
-
2. A method for manufacturing a semiconductor device, comprising:
-
forming a gate electrode layer over a substrate having an insulating surface; forming a gate insulating layer over the gate electrode layer; forming an oxide semiconductor layer over the gate insulating layer; heating the oxide semiconductor layer in an oxygen atmosphere, so that the oxide semiconductor layer is dehydrated or dehydrogenated; forming a source and drain electrode layers over the oxide semiconductor layer; forming an oxide insulating layer which is in contact with part of the oxide semiconductor layer, over the gate insulating layer, the oxide semiconductor layer, and the source and drain electrode layers; and performing a heat treatment in an oxygen atmosphere or an inert gas atmosphere.
-
-
3. A method for manufacturing a semiconductor device, comprising:
-
forming an oxide semiconductor layer over an insulating layer; heating the oxide semiconductor layer in an oxygen atmosphere; forming a source and drain electrode layers over the oxide semiconductor layer; forming an oxide insulating layer which is in contact with part of the oxide semiconductor layer, over the insulating layer, the oxide semiconductor layer, and the source and drain electrode layers; and performing a heat treatment in an oxygen atmosphere or an inert gas atmosphere.
-
-
4. A method for manufacturing a semiconductor device, comprising:
-
forming an oxide semiconductor layer over an insulating layer; heating the oxide semiconductor layer in an oxygen atmosphere, so that the oxide semiconductor layer is dehydrated or dehydrogenated; forming a source and drain electrode layers over the oxide semiconductor layer; forming an oxide insulating layer which is in contact with part of the oxide semiconductor layer, over the insulating layer, the oxide semiconductor layer, and the source and drain electrode layers; and performing a heat treatment in an oxygen atmosphere or an inert gas atmosphere.
-
Specification