METHOD OF FORMING A GROUP III-NITRIDE CRYSTALLINE FILM ON A PATTERNED SUBSTRATE BY HYDRIDE VAPOR PHASE EPITAXY (HVPE)
First Claim
1. A method of depositing a Group III-Nitride film comprising:
- providing a patterned substrate having a plurality of spaced apart features separated by a space, wherein said plurality of features have inclined sidewalls;
growing a Group III-Nitride film by hydride vapor phase epitaxial (HVPE) on said patterned substrate such that said Group III-Nitride film is grown with a first crystal orientation having a first growth rate in said space between said features and such that said Group III-Nitride film is grown with a second crystal orientation having a second growth rate on said incline sidewalls; and
growing said Group III-Nitride film such that said Group III-Nitride film having said first crystal orientation grows laterally over said Group III-Nitride film having said second crystal orientation.
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Abstract
A method of depositing a high quality low defect single crystalline Group III-Nitride film. A patterned substrate having a plurality of features with inclined sidewalls separated by spaces is provided. A Group III-Nitride film is deposited by a hydride vapor phase epitaxy (HVPE) process over the patterned substrate. The HVPE deposition process forms a Group III-Nitride film having a first crystal orientation in the spaces between features and a second different crystal orientation on the inclined sidewalls. The first crystal orientation in the spaces subsequently overgrows the second crystal orientation on the sidewalls and in the process turns over and terminates treading dislocations formed in the first crystal orientation.
112 Citations
23 Claims
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1. A method of depositing a Group III-Nitride film comprising:
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providing a patterned substrate having a plurality of spaced apart features separated by a space, wherein said plurality of features have inclined sidewalls; growing a Group III-Nitride film by hydride vapor phase epitaxial (HVPE) on said patterned substrate such that said Group III-Nitride film is grown with a first crystal orientation having a first growth rate in said space between said features and such that said Group III-Nitride film is grown with a second crystal orientation having a second growth rate on said incline sidewalls; and growing said Group III-Nitride film such that said Group III-Nitride film having said first crystal orientation grows laterally over said Group III-Nitride film having said second crystal orientation. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A semiconductor device comprising:
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a patterned substrate having a plurality of spaced apart features separated by a space wherein said plurality of features have inclined sidewalls; and a Group III-Nitride film formed on said patterned substrate wherein said Group III-Nitride film has a first crystal orientation in said space between said plurality of features and wherein said Group III-Nitride film has a second crystal orientation on said inclinded sidewalls of said features, and wherein said first crystal orientation is formed on said second crystal orientation. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23)
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Specification