SUBSTRATE SUPPORT HAVING FLUID CHANNEL
First Claim
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1. A substrate support comprising:
- (a) a chuck having a substrate receiving surface; and
(b) a base comprising;
(1) an upper wall comprising a recessed trench having (i) an attachment face at a first depth, and (ii) a fluid channel at a second depth;
(2) a lower wall seated in the recessed trench and attached to the attachment face of the upper wall, to close the fluid channel;
(3) a fluid inlet to supply a heat transfer fluid to the fluid channel; and
(4) a fluid outlet to discharge the heat transfer fluid from the fluid channel.
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Abstract
A support for a substrate processing chamber comprises a chuck having a substrate receiving surface, and a base comprising an upper wall comprising a recessed trench having (i) an attachment face at a first depth, and (ii) a fluid channel at a second depth. A lower wall is seated in the recessed trench and attached to the attachment face of the upper wall, to close the fluid channel. A fluid inlet is provided to supply a heat transfer fluid to the fluid channel and a fluid outlet provided to discharge the heat transfer fluid from the fluid channel.
113 Citations
20 Claims
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1. A substrate support comprising:
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(a) a chuck having a substrate receiving surface; and (b) a base comprising; (1) an upper wall comprising a recessed trench having (i) an attachment face at a first depth, and (ii) a fluid channel at a second depth; (2) a lower wall seated in the recessed trench and attached to the attachment face of the upper wall, to close the fluid channel; (3) a fluid inlet to supply a heat transfer fluid to the fluid channel; and (4) a fluid outlet to discharge the heat transfer fluid from the fluid channel. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A substrate support comprising:
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(a) an electrostatic chuck having a substrate receiving surface; and (b) a base comprising; (1) an upper wall comprising a recessed trench having (i) an attachment face at a first depth, and (ii) a fluid channel at a second depth, the fluid channel comprising at least one fin therein; (2) a lower wall seated in the recessed trench and attached to the attachment face of the upper wall, to close the fluid channel; (3) a fluid inlet to supply a heat transfer fluid to the fluid channel; and (4) a fluid outlet to discharge the heat transfer fluid from the fluid channel. - View Dependent Claims (14, 15, 16, 17, 18)
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19. A substrate support comprising:
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(a) an electrostatic chuck having a substrate receiving surface; and (b) a base comprising; (1) an upper wall comprising a recessed trench having (i) an attachment face at a first depth, and (ii) a fluid channel at a second depth, the fluid channel comprising at least one fin therein; (2) a lower wall seated in the recessed trench and attached to the attachment face of the upper wall, to close the fluid channel; (3) a fluid inlet and a fluid outlet that are near each other. - View Dependent Claims (20)
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Specification