WORKPIECE HANDLING SYSTEM
First Claim
Patent Images
1. A workpiece handling system comprising:
- a process chamber configured to support a workpiece for ion implantation;
a first mask stored outside the process chamber in a mask station; and
a robot system configured to retrieve the first mask from the mask station, and position the first mask upstream of the workpiece so the workpiece receives a first selective implant through the first mask.
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Abstract
A workpiece handling system includes a process chamber configured to support a workpiece for ion implantation, a first mask stored outside the process chamber in a mask station, and a robot system configured to retrieve the first mask from the mask station, and position the first mask upstream of the workpiece so the workpiece receives a first selective implant through the first mask. A method includes storing a first mask outside a process chamber in a mask station, retrieving the first mask from the mask station, positioning the first mask upstream of a workpiece positioned in the process chamber for ion implantation, and performing a first selective implant through the first mask.
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Citations
19 Claims
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1. A workpiece handling system comprising:
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a process chamber configured to support a workpiece for ion implantation; a first mask stored outside the process chamber in a mask station; and a robot system configured to retrieve the first mask from the mask station, and position the first mask upstream of the workpiece so the workpiece receives a first selective implant through the first mask. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method comprising:
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storing a first mask outside a process chamber in a mask station; retrieving the first mask from the mask station; positioning the first mask upstream of a workpiece positioned in the process chamber for ion implantation; and performing a first selective implant through the first mask. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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Specification