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POLYOL COMPOUND FOR PHOTORESIST

  • US 20110027725A1
  • Filed: 04/02/2009
  • Published: 02/03/2011
  • Est. Priority Date: 04/04/2008
  • Status: Abandoned Application
First Claim
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1. A polyol compound for photoresists, comprising at least one aliphatic group and at least one aromatic group bound to each other alternately, the aromatic group having at least one aromatic ring and two or more hydroxyl groups bound to the aromatic ring.

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