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DEPOSITION OF RUTHENIUM OR RUTHENIUM DIOXIDE

  • US 20110027977A1
  • Filed: 07/02/2010
  • Published: 02/03/2011
  • Est. Priority Date: 07/31/2009
  • Status: Active Grant
First Claim
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1. A method of depositing a ruthenium layer over a substrate, the method comprising:

  • supplying triruthenium dodecacarbonyl over a surface of a substrate to form a seed layer over the surface of the substrate; and

    conducting deposition over the seed layer, wherein the deposition comprises;

    supplying ruthenium tetraoxide over the seed layer.

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