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SUBSTRATE PROCESSING APPARATUS AND METHOD

  • US 20110028001A1
  • Filed: 03/27/2009
  • Published: 02/03/2011
  • Est. Priority Date: 03/27/2008
  • Status: Active Grant
First Claim
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1. A substrate processing apparatus comprising:

  • a process chamber providing an internal space, in which a process is carried out onto a substrate;

    a support member installed in the process chamber to support the substrate; and

    a shower head located above the support member to supply a source gas toward the support member,wherein the shower head includes;

    a first injection surface located at a position separated from the upper surface of the substrate placed on the support member by a first distance, and provided with outlets of first injection holes to inject the source gas; and

    a second injection surface located at a position separated from the upper surface of the substrate placed on the support member by a second distance being different from the first distance, and provided with outlets of second injection holes to inject the source gas.

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