MOVABLE BODY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

• US 20110032496A1
• Filed: 08/06/2010
• Published: 02/10/2011
• Est. Priority Date: 08/07/2009
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: SHIBAZAKI, Yuichi
• Granted Patent: US 9,164,400 B2
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70133 Measurement of illumination distribution, in pupil plane or field plane
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70725 control
• CPC Class Codes: G03F 7/70758 Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position
• CPC Class Codes: G03F 7/70858 Environment aspects, e.g. pressure of beam-path gas, temperature pollution aspects G03F7/70916
• CPC Class Codes: G03F 7/70866 of mask or workpiece
• CPC Class Codes: G03F 7/70933 Purge, e.g. exchanging fluid or gas to remove pollutants
• CPC Class Codes: G03F 7/70941 Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
• CPC Class Codes: Y10T 74/20354 Planar surface with orthogonal movement only

Abstract

One pair each of a Y linear motor (a total of four) on the +X side and the −X side that drive a reticle stage include one pair each of a stator section (a total of four) and three each of a mover section (a total of six) on the +X side and the −X side. In this case, the three each of the mover sections on the +X side and the −X side configure one each of a mover. The mover section located in the center in the Z-axis direction of each of the movers is used in common by each pair of the Y linear motors. Therefore, the weight of the mover section (reticle stage) of the reticle stage device is reduced, which allows a higher acceleration. Further, the mover section located in the center in the Z-axis direction of each of the movers coincides with a neutral plane of the reticle stage.

Claims

1. A movable body apparatus, comprising:

a movable body which holds an object and is movable in a direction parallel to a first axis in a two-dimensional plane; and

a drive system which includes a first and second mover provided on both sides of a direction parallel to a second axis perpendicular to the first axis within the two-dimensional plane of the movable body, and a first and second stator which each generates a drive force that drives the movable body at least in a direction parallel to the first axis by performing an electromagnetic interaction between the first and second movers, respectively, wherein

at least one of the first and second movers includes three mover sections which are placed at a predetermined distance in a direction parallel to a third axis orthogonal to the two-dimensional plane, and

of the first and second stators, the stator corresponding to the at least one of the first and second movers includes a pair of stator sections which shares a mover section positioned in the center in a direction parallel to the third axis.

2. The movable body apparatus according to claim 1 wherein

the drive system also generates a drive force which drives the movable body in a direction parallel to the second axis.

3. The movable body apparatus according to claim 1, the apparatus further comprising:

a position measuring instrument which obtains positional information in a plane parallel to the two-dimensional plane of the movable body.

4. The movable body apparatus according to claim 3 wherein

the position measuring instrument includes a plurality of heads which irradiates a measurement beam parallel to the third axis on a measurement plane that is parallel to the two-dimensional plane and is placed on one of the movable body and outside of the movable body, receives light from the measurement plane, and is placed on the other of the movable body and outside of the movable body.

5. The movable body apparatus according to claim 4 wherein

the measurement plane is placed on the movable body.

6. The movable body apparatus according to claim 5 wherein

the measurement plane is provided extending in a direction parallel to the first axis.

7. The movable body apparatus according to claim 6 wherein

the measurement plane is provided in a pair, and the pair of measurement planes are placed on one side and the other side in a direction parallel to the second axis with respect to the center of the movable body, a predetermined distance away from each other.

8. The movable body apparatus according to claim 4 wherein

a two-dimensional grating whose periodic direction is in a direction parallel to the first axis and in a direction parallel to the second axis is formed on the measurement plane.

9. The movable body apparatus according to claim 6 wherein

the plurality of heads includes two first heads whose measurement direction is in a direction parallel to the first axis and a second head whose measurement direction is in a direction parallel to the second axis.

10. The movable body apparatus according to claim 9 wherein

in each of the first and second heads, a direction parallel to the third axis serves further as a measurement direction.

11. The movable body apparatus according to claim 1, the apparatus further comprising:

a clamping device which is provided on the movable body and clamps the object from one side and the other side in a direction parallel to the first axis.

12. The movable body apparatus according to claim 11 wherein

the clamping device is fixed on the movable body, and includes a position setting member which is fixed on the movable body and sets a position when an end on one side of the object in the direction parallel to the first axis pushes against the position setting member, and a pressing member provided on the movable body which presses an end of the object on the other side in the direction parallel to the first axis.

13. The movable body apparatus according to claim 11 wherein

the movable body has a suction surface on which the object is suctioned and held.

14. An exposure apparatus which transfers a pattern formed on a mask on an object subject to exposure, the apparatus comprising:

the movable body apparatus according to claim 1 on which the mask serving as the object is mounted on the movable body.

15. The exposure apparatus according to claim 14, the apparatus further comprising:

an illumination system which illuminates the mask by an illumination light; and

a surface plate which supports the movable body in a non-contact manner.

16. The exposure apparatus according to claim 15 wherein

an opening which serves as an optical path of the illumination light via the mask is formed in the surface plate, and the apparatus further comprises;

an optical system which projects an image of a pattern formed on the mask on the object.

17. A device manufacturing method, including

forming a pattern on an object subject to exposure using the exposure apparatus according to claim 14;

and

developing the object on which the pattern is formed.

24. The exposure apparatus according to claim 1$ wherein

the carrier path of the mask including the placement position of the destaticizing apparatus is to be a purge space which is purged with a particular gas whose amount of at least one of substances responsible for haze and substances accelerating a reaction of haze of the mask is smaller than normal air.

18. An exposure apparatus which synchronously moves a mask and an object subject to exposure in a predetermined direction and transfers a pattern formed on the mask onto the object subject to exposure, the apparatus comprising:

a surface plate;

a slider which holds the mask and moves in predetermined strokes in a direction parallel to a first axis corresponding to the predetermined direction on the surface plate;

an illumination system which illuminates the mask by an illumination light;

a first measurement system which obtains a positional information of the slider when the slider is in a predetermined range including an irradiation area of the illumination light in a direction parallel to the first axis; and

a destaticizing apparatus which is provided on the surface plate on a carrier path of the mask positioned on one side of a direction parallel to the first axis with respect to the irradiation area of the illumination light, and removes static electricity with which the mask mounted on the slider is charged.

19. The exposure apparatus according to claim 18, the apparatus further comprising:

a vertical movement member which is provided at a position on the surface plate corresponding to one of a position where the destaticizing apparatus is provided and a predetermined delivery position on the upstream side of the carrier path, and moves vertically via an opening of the slider located at the delivery position.

20. The exposure apparatus according to claim 19, the apparatus further comprising:

a mask carrier member which carries the mask along a path parallel to the first axis, and performs delivery of the mask with the vertical movement member.

21. The exposure apparatus according to claim 18, the apparatus further comprising:

a second measurement system which obtains positional information of the slider located in a measurement range that includes a part of the carrier path of the mask including a placement position of the destaticizing apparatus and where a part of the measurement range overlaps with the measurement range of the first measurement system in the direction parallel to the first axis.

22. The exposure apparatus according to claim 18 wherein

the destaticizing apparatus is a system using photoionization.

23. The exposure apparatus according to claim 22 wherein

the system using the photoionization includes an X-ray ionizer.

25. The exposure apparatus according to claim 18, the apparatus further comprising:

an opposing member which opposes the slider via a predetermined clearance gap and forms a space substantially isolated from an outer space of the slider above the mask of the slider when the slider is at a position whose positional information is obtained by the first measurement system in a direction parallel to the first axis.

26. The exposure apparatus according to claim 25 wherein

an inside of the space above the mask is purged with a particular gas whose amount of at least one of substances responsible for haze and substances accelerating a reaction of haze of the mask is smaller than normal air.

27. The exposure apparatus according to claim 25 wherein

at least a part of the opposing member is configured by a cooling device which cools off the mask.

28. The exposure apparatus according to claim 27 wherein

the cooling device is placed on both sides of an irradiation area of the illumination light in a direction parallel to the first axis.

29. The exposure apparatus according to claim 27 wherein

the mask is cooled by the cooling device during the synchronous movement between the mask and the object subject to exposure so as to transfer the pattern onto the object subject to exposure.

30. The exposure apparatus according to claim 27 wherein

the first measurement system obtains a positional information of the slider at a plurality of measurement points within the two-dimensional plane by an optical method.

31. The exposure apparatus according to claim 30 wherein

the first measurement system obtains shape information of the slider, using the positional information at least in three measurement points which are distanced apart from each other in a direction parallel to the second axis of the plurality of measurement points.

32. A device manufacturing method, including

transferring a pattern on an object using the exposure apparatus according to claim 18;

and

developing the object on which the pattern is transferred.

59. The exposure method according to claim 18 wherein

the space above the mask is purged with a particular gas.

33. An exposure apparatus which synchronously moves a mask and an object subject to exposure in a predetermined direction and transfers a pattern formed on the mask onto the object subject to exposure via a projection optical system, while illuminating an illumination light on the mask on which the pattern is formed, the apparatus comprising:

a movable body which holds the mask and moves in a direction parallel to a first axis corresponding to the predetermined direction on a two-dimensional plane orthogonal to a substantial optical axis of the projection optical system;

a surface position measurement system which has a measurement area at a position distanced from the projection optical system on one side in a direction parallel to the first axis, and measures a first surface position information in a direction parallel to the optical axis of the patterned surface of the mask held by the movable body at a first measurement point inside the measurement area;

a first measurement system which measures a second surface position information in a direction parallel to the optical axis of the movable body at a second measurement point which is in a predetermined positional relation with the measurement area;

a second measurement system which measures a third surface position information in a direction parallel to the optical axis of the movable body at a third measurement point which is in the same positional relation as the measurement area and the second measurement point, with respect to an irradiation area of the illumination light corresponding to an area on the patterned plane projected on the object by the projection optical system; and

a control system which controls a position of the movable body, based on measurement information of the surface position measurements system, the first measurement system, and the second measurement system.

34. The exposure apparatus according to claim 33 wherein

the surface position measurement system has a plurality of the first measurement points placed inside the measurement area.

35. The exposure apparatus according to claim 34 wherein

the plurality of the first measurement points is arranged along a direction parallel to a second axis that is orthogonal to the first axis in the two-dimensional plane.

36. The exposure apparatus according to claim 35 wherein

the third measurement point is placed at the same position as the first measurement point in a direction parallel to the first axis.

37. The exposure apparatus according to claim 34, the apparatus further comprising:

a surface plate which supports the movable body in a direction orthogonal to the two-dimensional plane and on which a guide surface parallel to the two-dimensional plane is formed, and

in the plurality of the first measurement points, a plurality of first heads which irradiates a measurement beam on the patterned surface of the mask and receives the reflected light is placed, and the plurality of first heads is placed within the surface plate.

38. The exposure apparatus according to claim 37 wherein

in the second and third measurement points, each of a plurality second heads is placed which irradiates a measurement beam on a measurement plane parallel to the two-dimensional plane provided on the movable body and receives the reflected light, and

the plurality of second heads are placed within the surface plate along with the plurality of first heads.

39. A device manufacturing method, including

forming a pattern on an object subject to exposure using the exposure apparatus according to claim 33, and

developing the object subject to exposure on which the pattern is formed.

42. The exposure apparatus according to claim 37 wherein

one each of the measurement planes is provided distanced apart in a direction parallel to the second axis with an irradiation area of the illumination light placed in between, and

the plurality of heads obtaining the positional information in at least the three measurement points include at least one head each that irradiates a measurement beam on each of the measurement planes.

40. An exposure apparatus which synchronously moves a mask and an object subject to exposure in a predetermined direction and transfers a pattern formed on the mask onto the object subject to exposure via a projection optical system, while illuminating an illumination light on the mask on which the pattern, is formed, the apparatus comprising;

a movable body which holds the mask and moves in a direction parallel to a first axis corresponding to the predetermined direction on a two-dimensional plane;

a drive system which has a pair of movers fixed to both ends of the movable body in a direction parallel to a second axis perpendicular to the first axis within the two-dimensional plane, and a pair of stators engaging with the pair of movers, and makes a drive farce generated between the mover and the stator act on the movable body to drive the movable body in a direction parallel to the first axis and to deform the movable body; and

a measurement system which obtains positional information of the movable body at a plurality of measurement points within the two-dimensional plane by an optical method, and also obtains shape information of the movable body using the positional information at least in three measurement points which are distanced apart from each other in a direction parallel to the second axis of the plurality of measurement points.

41. The exposure apparatus according to claim 40 wherein

the measurement system has a plurality of heads which irradiates a measurement beam on a measurement plane parallel to the two-dimensional plane provided on one of the projection optical system and the movable body, receives the beam from the measurement plane, and obtains positional information of the movable body with the irradiation point of the measurement beam on the measurement plane serving as the measurement point, and are arranged on the other of the projection optical system and the movable body.

43. The exposure apparatus according to claim 41 wherein

a grating whose periodic direction is in directions parallel to the first axis and the second axis is formed on the measurement plane.

44. The exposure apparatus according to claim 43 wherein

the plurality of heads include two first heads whose measurement direction is in a direction parallel to the first axis and a direction perpendicular to the two-dimensional plane, one second head whose measurement direction is in a direction parallel to the second axis and the perpendicular direction, and at least one head whose measurement direction is the perpendicular direction which is distanced apart in a direction parallel to the second axis from the first and second heads for one measurement plane.

45. The exposure apparatus according to claim 44 wherein

the two first heads irradiate a measurement beam on a point on the measurement plane corresponding to both ends in the direction parallel to the first axis of an irradiation area on the mask where the illumination light is irradiated, respectively, and the second head irradiates a measurement beam on a point on the measurement plane corresponding to the center of the scanning direction of the irradiation area.

46. The exposure apparatus according to claim 41 wherein

the measurement plane is provided on a surface of the movable body on a rear surface side with respect to a surface where the mask is held.

47. The exposure apparatus according to claim 41 wherein

the measurement plane is extended parallel to the first axis.

48. The exposure apparatus according to claim 40 wherein

the measurement system obtains a flexure of the movable body in a direction parallel to the second axis.

49. The exposure apparatus according to claim 40, the apparatus further comprising:

a surface plate which has a support section that supports the movable body, and

the drive system deforms the movable body with the support section serving as a supporting point.

50. The exposure apparatus according to claim 49 wherein

the drive system drives each of the pair of movers in a direction perpendicular to the measurement plane with respect to a stator which engages with the mover.

51. The exposure apparatus according to claim 49 wherein

the surface plate has an opening which serves as a path of the energy beam, and has one each of the support section on both sides in a direction parallel to the second axis with the opening in between.

52. The exposure apparatus according to claim 51 wherein

a separation distance between the support sections in the direction parallel to the second axis is smaller than a separation distance in a direction parallel to the second axis of the pair of movers.

53. A device manufacturing method, including

transferring a pattern on an object subject to exposure using the exposure apparatus according to claim 40, and

developing the object subject to exposure on which the pattern is formed.

65. A device manufacturing method, including

transferring a pattern on an object by the exposure method according to claim 52;

and

developing the object on which the pattern is transferred.

54. An exposure method in which a mask and an object is synchronously moved in a predetermined direction and a pattern formed on the mask is transferred onto the object via a projection optical system, while illuminating an illumination light on the mask on which the pattern is formed, the method comprising:

obtaining a first surface position information in a direction parallel to the optical axis of a patterned surface of the mask held by a movable body at a first measurement point within a measurement area placed apart from the projection optical system on one side of a direction parallel to a first axis, and a second surface position information in a direction parallel to the optical axis of the movable body at a second measurement point in a predetermined relation with the measurement area, while moving the movable body holding the mask in a direction parallel to the first axis corresponding to the predetermined direction on a two-dimensional plane orthogonal to a substantial optical axis of the projection optical system in synchronous with the object; and

measuring a third surface position information in a direction parallel to the optical axis of the projection optical system of the movable body at a third measurement point which is in the same positional relation as a positional relation between the measurement area and the second measurement point with respect to an irradiation area of the illumination light, when irradiating the pattern with the illumination light and projecting the pattern on the object with the projection optical system, while making the synchronous movement of the object and the movable body continue, and controlling a position in a direction parallel to the optical axis of the movable body based on results of the measurement and a relation between the first surface position information and the second surface position information.

55. A device manufacturing method, including

forming a pattern on an object using the exposure method according to claim 54;

and

processing the object on which the pattern is formed.

56. An exposure method in which a mask and an object is synchronously moved in a predetermined direction and a pattern formed on the mask is transferred onto the object, the method comprising:

obtaining a positional information of a slider when the slider which holds the mask and moves in predetermined strokes in a direction parallel to a first axis corresponding to the predetermined direction on a surface plate is within a predetermined range including an irradiation area of an illumination light irradiated on the mask in a direction parallel to the first axis; and

removing static electricity with which the mask mounted on the slider is charged, using a destaticizing apparatus which is provided on the surface plate on a carrier path of the mask positioned on one side of a direction parallel to the first axis in the irradiation area of the illumination light.

57. The exposure method according to claim 56 wherein

the carrier path of the mask including the placement position of the destaticizing apparatus is to be a purge space which is purged with a particular gas whose amount of at least one of substances responsible for haze of the mask and substances accelerating a reaction of haze is smaller when compared to normal air.

58. The exposure method according to claim 56, the method further comprising:

forming a space above the mask of the slider which is substantially isolated from the outside space of the slider by making an opposing member face the slider via a predetermined clearance gap when the slider is at a position where the positional information is obtained by the first measurement system in a direction parallel to the first axis.

60. The exposure method according to claim 58 wherein

at least apart of the opposing member is configured by a cooling device which cools the mask.

61. The exposure method according to claim 60 wherein

the cooling device is placed on both sides in an irradiation area of the illumination light in a direction parallel to the first axis.

62. The exposure method according to claim 60 wherein

the mask is cooled by the cooling device during the synchronous movement of the mask and the object to transfer the pattern onto the object.

63. The exposure method according to claim 60 wherein

a positional information of the slider at a plurality of measurement points within the two-dimensional plane is obtained by an optical method.

64. The exposure method according to claim 63 wherein

shape information of the slider is obtained, using the positional information at least in three measurement points which are distanced apart from each other in a direction parallel to the second axis of the plurality of measurement points.