MICROELECTRONIC DEVICE AND FABRICATING METHOD THEREOF AND MEMS PACKAGE STRUCTURE AND FABRICATING METHOD THEREOF
First Claim
1. A fabricating method of a microelectronic device, comprising the steps of:
- providing a substrate having a CMOS circuit region and a micro electromechanical system (MEMS) region;
forming a semi-conductor element in the CMOS circuit region of the substrate;
forming at least a first metallic layer, a plurality of first contact plugs and at least a first oxide layer on the substrate, the at least a first metallic layer and the at least a first oxide layer interlaced with each other, the first contact plugs formed in the at least a first oxide layer and connected with the at least a first metallic layer correspondingly;
forming a first protective layer on a portion of the at least a first oxide layer within the MEMS region;
forming a plurality of second metallic layers, a plurality of second contact plugs and a plurality of second oxide layers on the at least a first oxide layer and the first protective layer, the second metallic layers and the second oxide layers interlaced with each other, the second contact plugs formed in the second oxide layers and connected with the second metallic layers, portions of the second metallic layers, the second contact plugs and the second oxide layers located within the MEMS region composing a MEMS structure, and other portions of the second metallic layers, the second contact plugs and the second oxide layers located within the CMOS circuit region and portions of the at least a first metallic layer, the first contact plugs and the at least a first oxide layer located within the CMOS circuit region composing an interconnecting structure;
forming a second protective layer on the interconnecting structure, thereby covering the interconnecting structure; and
removing predetermined portions of the second oxide layers within the MEMS region and thereby making the MEMS structure partially suspended above the substrate to be a MEMS element.
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Accused Products
Abstract
A fabricating method of a microelectronic device including the following steps is provided. First, a substrate is provided. Second, a semi-conductor element is formed in a CMOS circuit region of the substrate. Next, a plurality of metallic layer, a plurality of contact plugs and a plurality of oxide layer are formed on the substrate. The metallic layers and the oxide layers are interlaced with each other and the contact plugs are formed in the oxide layers and connected with the metallic layers correspondingly so as to form a micro electromechanical system (MEMS) structure within a MEMS region and an interconnecting structure within the CMOS circuit region. Then, a first protective layer is formed on at least one of the oxide layers and a second protective layer is formed on the interconnecting structure. Predetermined portions of the oxide layers located within the MEMS region are removed and thereby the MEMS structure is partially suspended above the substrate. The present invention also provides a microelectronic device, a MEMS package structure and a fabricating method thereof
46 Citations
20 Claims
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1. A fabricating method of a microelectronic device, comprising the steps of:
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providing a substrate having a CMOS circuit region and a micro electromechanical system (MEMS) region; forming a semi-conductor element in the CMOS circuit region of the substrate; forming at least a first metallic layer, a plurality of first contact plugs and at least a first oxide layer on the substrate, the at least a first metallic layer and the at least a first oxide layer interlaced with each other, the first contact plugs formed in the at least a first oxide layer and connected with the at least a first metallic layer correspondingly; forming a first protective layer on a portion of the at least a first oxide layer within the MEMS region; forming a plurality of second metallic layers, a plurality of second contact plugs and a plurality of second oxide layers on the at least a first oxide layer and the first protective layer, the second metallic layers and the second oxide layers interlaced with each other, the second contact plugs formed in the second oxide layers and connected with the second metallic layers, portions of the second metallic layers, the second contact plugs and the second oxide layers located within the MEMS region composing a MEMS structure, and other portions of the second metallic layers, the second contact plugs and the second oxide layers located within the CMOS circuit region and portions of the at least a first metallic layer, the first contact plugs and the at least a first oxide layer located within the CMOS circuit region composing an interconnecting structure; forming a second protective layer on the interconnecting structure, thereby covering the interconnecting structure; and removing predetermined portions of the second oxide layers within the MEMS region and thereby making the MEMS structure partially suspended above the substrate to be a MEMS element. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A fabricating method, comprising:
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providing a substrate having a CMOS circuit region and a micro electromechanical system (MEMS) region; forming a semi-conductor element within the CMOS circuit region of a substrate; forming a plurality of metallic layers, a plurality of contact plugs and a plurality of oxide layers on the substrate, the metallic layers and the oxide layers interlaced with each other, the contact plugs formed in the oxide layers and connected with the metallic layers correspondingly so as to form an interconnecting structure above the CMOS circuit region, portions of the metallic layers, the contact plugs and the oxide layers located within the MEMS region composing a MEMS structure, and one of the metallic layers located above the MEMS structure having a plurality of first openings; forming a protective layer on the interconnecting structure, thereby covering the interconnecting structure; forming a mask layer with a plurality of second openings above the MEMS structure, the second openings and the first openings staggered with each other; removing predetermined portions of the oxide layers within the MEMS region by employing the first openings and the second openings as etching channels, thereby making the MEMS structure partially suspended above the substrate to be a MEMS element; and forming a packaging layer on the protective layer and the mask layer, the packaging layer filling in the second openings, thereby sealing the MEMS element between the metallic layers and the substrate. - View Dependent Claims (8, 9, 10, 11, 12)
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13. A microelectronic device, comprising:
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a substrate having a CMOS circuit region and a micro electromechanical system (MEMS) region; at least a semi-conductor element configured within the CMOS circuit region of the substrate; an anti metal ion layer disposed within the CMOS circuit region of the substrate and covering the semi-conductor element; a non-doping oxide layer disposed on the substrate within the MEMS region; and a MEMS structure partially suspended above the non-doping oxide layer. - View Dependent Claims (14, 15)
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16. A micro electromechanical system (MEMS) package structure, comprising:
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a substrate; a MEMS structure partially suspended above the substrate; a metallic layer with a plurality of first openings disposed above the MEMS structure; a mask layer with a plurality of second openings disposed above the metallic layer, wherein the second openings and the first openings staggered with each other; and a packaging layer disposed on the mask layer and filling into the second openings so as to connect to the metallic layer. - View Dependent Claims (17, 18)
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19. A method for fabricating a micro electromechanical system (MEMS) package, comprising:
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providing a substrate; forming a plurality of metallic layers, a plurality of contact plugs and a plurality of oxide layers so as to compose a MEMS structure, wherein one of the metallic layers disposed above the MEMS structure having a plurality of first openings; forming a mask layer with a plurality of second openings on the top one of metallic layers, the second openings and the first openings staggered with each other; removing predetermined portions of the oxide layers by employing the first openings and the second openings as etching channels, thereby making the MEMS structure partially suspended above the substrate; and forming a packaging layer on the mask layer, the packaging layer filling into the second openings, thereby sealing the MEMS structure between the metallic layers and the substrate. - View Dependent Claims (20)
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Specification