SOLUTION PROCESSED THIN FILMS AND LAMINATES, DEVICES COMPRISING SUCH THIN FILMS AND LAMINATES, AND METHOD FOR THEIR USE AND MANUFACTURE

• US 20110045406A1
• Filed: 07/14/2010
• Published: 02/24/2011
• Est. Priority Date: 11/01/2006
• Status: Active Grant

• Current Assignee: Oregon State University (Oregon University System)
• Original Assignee: German University, Oregon State University (Oregon University System)
• Inventors: Stowers, Jason K., Keszler, Douglas A., Meyers, Stephen T., Anderson, Jeremy, Hersh, Peter A.
• Granted Patent: US 8,206,892 B2
• Time in Patent Office: Days
• US Class Current: 430/270.1
• CPC Class Codes: C01G 1/10 Sulfates
• CPC Class Codes: C01G 25/006 Compounds containing, besides zirconium, two or more other elements, with the exception of oxygen or hydrogen
• CPC Class Codes: C01G 25/06 Sulfates
• CPC Class Codes: C01G 27/006 Compounds containing, besides hafnium, two or more other elements, with the exception of oxygen or hydrogen
• CPC Class Codes: C01G 27/06 Sulfates
• CPC Class Codes: C01P 2002/02 Amorphous compounds
• CPC Class Codes: C01P 2002/72 by d-values or two theta-values, e.g. as X-ray diagram
• CPC Class Codes: C01P 2002/88 by thermal analysis data, e.g. TGA, DTA, DSC
• CPC Class Codes: C01P 2004/03 obtained by SEM
• CPC Class Codes: C01P 2004/04 obtained by TEM, STEM, STM or AFM
• CPC Class Codes: C01P 2006/40 Electric properties
• CPC Class Codes: C23C 18/06 Coating on selected surface areas, e.g. using masks
• CPC Class Codes: C23C 18/1216 Metal oxides C23C18/1212 takes precedence
• CPC Class Codes: C23C 18/1225 Deposition of multilayers of inorganic material
• CPC Class Codes: C23C 18/1295 with after-treatment of the deposited inorganic material
• CPC Class Codes: G02B 1/10 Optical coatings produced by application to, or surface treatment of, optical elements G02B1/08 takes precedence
• CPC Class Codes: H01L 21/02181 the material containing hafnium, e.g. HfO2
• CPC Class Codes: H01L 21/02189 the material containing zirconium, e.g. ZrO2
• CPC Class Codes: H01L 21/02192 the material containing at least one rare earth metal element, e.g. oxides of lanthanides, scandium or yttrium
• CPC Class Codes: H01L 21/02194 the material containing more than one metal element
• CPC Class Codes: H01L 21/02282 : liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
• CPC Class Codes: H01L 21/0337 : characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
• CPC Class Codes: H01L 21/28194 : by deposition, e.g. evaporation, ALD, CVD, sputtering, laser deposition H01L21/28202 takes precedence
• CPC Class Codes: H01L 29/4908 : for thin film semiconductor, e.g. gate of TFT
• CPC Class Codes: H01L 29/7869 : having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
• CPC Class Codes: Y10S 430/114 : Initiator containing
• CPC Class Codes: Y10S 430/143 : Electron beam

Abstract

Devices having a thin film or laminate structure comprising hafnium and/or zirconium oxy hydroxy compounds, and methods for making such devices, are disclosed. The hafnium and zirconium compounds can be doped, typically with other metals, such as lanthanum. Examples of electronic devices or components that can be made include, without limitation, insulators, transistors and capacitors. A method for patterning a device using the materials as positive or negative resists or as functional device components also is described. For example, a master plate for imprint lithography can be made. An embodiment of a method for making a device having a corrosion barrier also is described. Embodiments of an optical device comprising an optical substrate and coating also are described. Embodiments of a physical ruler also are disclosed, such as for accurately measuring dimensions using an electron microscope.

Claims

1. An aqueous inorganic patterning composition comprising water, metal suboxide cations, polyatomic anions, and a coordinating species comprising a peroxide group, wherein the composition comprise Cu, Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Nb, Mo, In, Sn, Sb, Hf, Ta, W, Ir, Pt, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu or a combination thereof.

2. The aqueous composition of claim 1 wherein the metal suboxide cations comprise ZrO⁺² cations, HfO⁺² cations or a combination thereof.

3. The aqueous composition of claim 1 wherein the polyatomic anions comprise tungstate, phosphate, nitrate, silicate, aluminate, borate or combinations thereof.

4. The aqueous composition of claim 1 wherein the polyatomic anion comprises sulfate.

5. The aqueous composition of claim 1 further comprising NH₃, OH⁻

, F⁻

, Cl⁻

, Br⁻

, I⁻

, or a combination thereof.

6. A method for forming a pattern of an inorganic material on a substrate, comprising:

providing a substrate having a coating composition, the coating composition comprising metal suboxide cations, polyatomic anions, and a coordinating species comprising a peroxide group, the coating composition further comprising Cu, Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Nb, Mo, In, Sn, Sb, Hf, Ta, W, Ir, Pt, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu or a combination thereof; and

exposing the coating composition to radiation in a pattern such that first portions of the coating are exposed to the radiation and second portions of the coating are not exposed to the radiation, thereby forming an exposed patterned coating.

7. The method of claim 6 wherein the radiation comprises an electron beam or ultraviolet light.

8. The method of claim 6 wherein exposing the coating composition to the radiation condenses exposed first portions of the coating composition.

9. The method of claim 6 wherein the metal suboxide cations comprise ZrO⁺² cations, HfO⁺² cations or a combination thereof, wherein the polyatomic anions comprise sulfate anions, and wherein the coating composition further comprises F⁻

, Cl⁻

, Br⁻

, I⁻

, or a combination thereof.

10. The method of claim 6 further comprising etching after exposure to the radiation to remove unexposed second portions of the coating composition.

11. The method of claim 10 wherein the etching is performed with tetramethyl ammonium hydroxide.

12. The method of claim 6 further comprising heating the coating composition prior to exposure with radiation.

13. The method of claim 6 wherein the coating composition is heated to a temperature above about 100°

C. after exposing the coating composition to the radiation pattern and prior to etching the exposed coating composition with an acid or a base to remove unexposed second portions of the coating composition.

14. The method of claim 6 further comprising contacting the exposed coating composition with a composition selected from hydrochloric acid, sulfuric acid, hydrogen peroxide, sodium hydroxide, or tetramethyl ammonium hydroxide, to remove a portion of the material to form the pattern.

15. The method of claim 6 wherein the coating composition has a thickness of from about 1 nm to about 100 nm.

16. The method of claim 15 further comprising developing the exposed coating composition to remove the exposed material.

17. The method according to claim 6 where providing a substrate having a coating composition comprises acquiring the coated substrate.

18. The method according to claim 6 where providing a substrate having a coating composition comprises:

forming an aqueous composition comprising water, metal suboxide cations, polyatomic anions, and a coordinating species comprising a peroxide group, wherein the composition comprises Cu, Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Nb, Mo, In, Sn, Sb, Hf, Ta, W, Ir, Pt, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu or a combination thereof; and

depositing the composition onto the substrate.

19. A method for forming an inorganic patterning composition, the method comprising mixing an aqueous solution comprising metal suboxide cations, polyatomic anions and a coordinating species comprising a peroxide group, to form an inorganic patterning composition, wherein the composition comprises Cu, Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Nb, Mo, In, Sn, Sb, Hf, Ta, W, Ir, Pt, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu or a combination thereof.

20. The method of claim 19 wherein the coordinating species comprises hydrogen peroxide.

21. The method of claim 19 wherein the polyatomic anions comprise sulfate anions.

22. The method of claim 19 wherein the metal suboxide cations comprise ZrO⁺² cations, HfO⁺² cations or a combination thereof, and wherein the polyatomic anions comprise sulfate, phosphate, nitrate, silicate, aluminate, borate or combinations thereof.