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REMOTE PLASMA SOURCE SEASONING

  • US 20110045676A1
  • Filed: 08/18/2009
  • Published: 02/24/2011
  • Est. Priority Date: 08/18/2009
  • Status: Active Grant
First Claim
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1. A method of forming a silicon-containing layer on a surface of a substrate within a processing region, the method comprising:

  • cleaning an interior surface of a remote plasma region, wherein the cleaning operation comprises;

    flowing a cleaning gas into the remote plasma region, and forming a cleaning plasma in the remote plasma region; and

    treating the interior surface, wherein the treating operation comprises;

    flowing a first silicon-containing precursor into the remote plasma region, andforming a treatment plasma in the remote plasma region to deposit a protective silicon-containing film on the interior surface.

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