Gas Distribution Apparatus and Substrate Processing Apparatus Having the Same

• US 20110048325A1
• Filed: 02/26/2010
• Published: 03/03/2011
• Est. Priority Date: 03/03/2009
• Status: Abandoned Application

• Current Assignee: Jusung Engineering Company Limited
• Original Assignee: Jusung Engineering Company Limited
• Inventors: Choi, Sun Hong, Lee, Young Hee, Lee, Seung Ho
• Application Number:
  US12/746,505
• Publication Number:
  US 20110048325A1
• Time in Patent Office: Days
• US Class Current: 118/712
• CPC Class Codes: C23C 16/452 by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
• CPC Class Codes: C23C 16/45565 Shower nozzles
• CPC Class Codes: C23C 16/45574 Nozzles for more than one gas
• CPC Class Codes: C23C 16/45591 Fixed means, e.g. wings, baffles

Abstract

Provided are a gas distribution apparatus and a substrate treating apparatus including the same. The substrate treating apparatus includes a chamber comprising a reaction space, a substrate seat unit disposed in the reaction space of the chamber to radially seat a plurality of substrates with respect to a center thereof, and a gas distribution device comprising a first gas distribution part configured to eject at least two source materials onto a substrate through routes different from each other and a second gas distribution part configured to eject a source material having a decomposition temperature greater than an average of decomposition temperatures of the at least two source materials onto the substrate. The first gas distribution part is divided into at least two sections and disposed such that the second gas distribution part is positioned therebetween; and couplable and separable to/from one another.

Claims

1. A gas distribution apparatus comprising:

a first gas distribution part configured to eject at least two source materials onto a substrate through routes different from each other; and

a second gas distribution part configured to eject a source material having a decomposition temperature greater than an average of decomposition temperatures of the at least two source materials onto the substrate,

wherein the first gas distribution part is divided into at least two sections and disposed such that the second gas distribution part is positioned therebetween; and

couplable and separable to/from one another.

2. The gas distribution apparatus of claim 1, wherein the first gas distribution part comprises:

a first gas distribution plate connected to a first gas inlet tube configured to introduce a first processing gas, the first gas distribution plate comprising a plurality of first through holes to pass through the first processing gas;

a second gas distribution plate connected to a second gas inlet tube configured to introduce a second processing gas, the second gas distribution plate comprising a plurality of second through holes aligned with the plurality of first through holes to pass through the first processing gas and a plurality of third through holes passing through the second processing gas; and

a third gas distribution plate comprising;

a plurality of first and second nozzles aligned with the plurality of second and third through holes and configured to respectively eject the first and second processing gases; and

a space in which a refrigerant flows.

3. The gas distribution apparatus of claim 2, wherein the first gas distribution plate comprises:

a housing comprising a space configured to receive the first processing gas supplied from the first gas inlet tube; and

a distribution unit disposed within the space, the distribution unit being configured to uniformly distribute the first processing gas introduced from the first gas inlet tube.

4. The gas distribution apparatus of claim 3, wherein the distribution unit comprises a plate and a plurality of supply holes defined by punching the plate.

5. The gas distribution apparatus of claim 2, wherein the second gas distribution plate comprises:

a housing connected to the second gas inlet tube, the housing providing a space configured to receive the second processing gas;

a plurality of pillars comprising the plurality of second through holes in the space; and

a plurality of third through holes defined by punching a lower portion of the housing.

6. The gas distribution apparatus of claim 5, wherein the second gas distribution plate comprises:

a partition disposed within the space; and

a buffer space divided by a sidewall of the housing and the partition, the buffer space being configured to receive the second processing gas supplied from the second gas inlet tube.

7. The gas distribution apparatus of claim 6, wherein the second gas distribution plate comprises a supply hole in the partition to supply the second processing gas of the buffer space to the space.

8. The gas distribution apparatus of claim 2, wherein the third gas distribution plate comprises:

a housing in which the plurality of first and second nozzles is disposed, the housing comprising the space in which the refrigerant flows; and

a refrigerant flow tube connected to the housing to supply or discharge the refrigerant.

9. The gas distribution apparatus of claim 8, wherein the housing comprises a sidewall surrounding a lateral surface of the space, an upper plate disposed above the sidewall to communicate with the plurality of first and second nozzles, and a lower plate disposed below the sidewall to communicate with the plurality of first and second nozzles.

10. The gas distribution apparatus of claim 8, wherein the housing comprises a sidewall surrounding a lateral surface of the space and a lower plate in which the plurality of first and second nozzles directly contacting the second gas distribution plate is disposed.

11. The gas distribution apparatus of claim 1, further comprising a temperature meter disposed on at least one of the second gas distribution plate and the third gas distribution plate.

12. The gas distribution apparatus of claim 1, wherein the second gas distribution part is disposed at a central portion of a lower side of a chamber lid, and the at least two first gas distribution parts are disposed below the chamber lid such that the second gas distribution part is positioned therebetween.

13. The gas distribution apparatus of claim 1, wherein at least one of the at least two first gas distribution plates is spaced apart from each other.

14. The gas distribution apparatus of claim 1 or claim 13, further comprising at least one third gas distribution part disposed between the at least two first gas distribution parts to eject a fuzzy gas.

15. The gas distribution apparatus of claim 14, wherein the third gas distribution part ejects the fuzzy gas toward an outer side of the substrate.

16. The gas distribution apparatus of claim 15, wherein protrusions are formed at both lateral surfaces of the at least two first gas distribution parts, and grooves corresponding to the protrusions are formed at both lateral surfaces of the third gas distribution part to insert protrusions into the grooves, thereby coupling the third gas distribution part between the first gas distribution parts.

17. The gas distribution apparatus of claim 14, wherein a temperature detector is disposed below the at least one third gas distribution part.

18. A substrate treating apparatus comprising:

a chamber comprising a reaction space;

a substrate seat unit disposed in the reaction space of the chamber to radially seat a plurality of substrates with respect to a center thereof; and

a gas distribution device comprising a first gas distribution part configured to eject at least two source materials onto a substrate through routes different from each other and a second gas distribution part configured to eject a source material having a decomposition temperature greater than an average of decomposition temperatures of the at least two source materials onto the substrate,

wherein the first gas distribution part is divided into at least two sections, and the divided first gas distribution parts are disposed such that the second gas distribution part is positioned therebetween; and

couplable and separable to/from one another.

19. The gas distribution apparatus of claim 18, wherein the chamber comprises a chamber body in which the reaction space is provided and a chamber lid configured to seal the reaction space, and the first and second gas distribution parts are fixed to the chamber lid.

20. The gas distribution apparatus of claim 18, wherein a refrigerant path through which a refrigerant is circulated is disposed in the chamber lid.

21. The gas distribution apparatus of claim 18, wherein the first gas distribution part comprises:

a first gas distribution plate connected to a first gas inlet tube configured to introduce a first processing gas, the first gas distribution plate comprising a plurality of first through holes to pass through the first processing gas;

a second gas distribution plate connected to a second gas inlet tube configured to introduce a second processing gas, the second gas distribution plate comprising a plurality of second through holes aligned with the plurality of first through holes to pass through the first processing gas and a plurality of third through holes passing through the second processing gas; and

a third gas distribution plate comprising a plurality of first and second nozzles aligned with the plurality of second and third through holes and configured to respectively eject the first and second processing gases, and a space in which a refrigerant flows.

22. The gas distribution apparatus of claim 18, wherein the second gas distribution part comprises at least one central injection nozzle disposed in a chamber region corresponding to a central region of the substrate seat unit.

23. The gas distribution apparatus of claim 18, wherein the second gas distribution part comprises:

a central injection nozzle disposed in a central region of the first gas distribution part;

an extension injection nozzle extending into a space between the first gas distribution parts; and

an extension path communicating with the central injection nozzle and the extension injection nozzle.

24. The gas distribution apparatus of claim 18, further comprising a path change device disposed in a lower region of the second gas distribution part to eject a processing gas supplied from the second gas distribution part toward the substrate.

25. The gas distribution apparatus of claim 24, wherein the path change device comprises:

a fixed plate a portion of which is connected to each of the plurality of first gas distribution parts, the fixed plate being disposed at a centre of the plurality of the first gas distribution parts;

an extension path extending from a central region of the fixed plate toward the substrate seat unit; and

a path change nozzle disposed at an end region of the extension path.

26. The gas distribution apparatus of claim 18, further comprising a heating unit configured to heat a processing gas ejected from the second gas distribution part or a plasma generation device configured to ionize the processing gas ejected from the second gas distribution part using plasma.

27. The gas distribution apparatus of claim 18, further comprising a protrusion disposed on the substrate seat unit, the protrusion being inserted into a lower side of the second distribution part between the first gas distribution parts.