Gas Distribution Apparatus and Substrate Processing Apparatus Having the Same
First Claim
1. A gas distribution apparatus comprising:
- a first gas distribution part configured to eject at least two source materials onto a substrate through routes different from each other; and
a second gas distribution part configured to eject a source material having a decomposition temperature greater than an average of decomposition temperatures of the at least two source materials onto the substrate,wherein the first gas distribution part is divided into at least two sections and disposed such that the second gas distribution part is positioned therebetween; and
couplable and separable to/from one another.
1 Assignment
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Accused Products
Abstract
Provided are a gas distribution apparatus and a substrate treating apparatus including the same. The substrate treating apparatus includes a chamber comprising a reaction space, a substrate seat unit disposed in the reaction space of the chamber to radially seat a plurality of substrates with respect to a center thereof, and a gas distribution device comprising a first gas distribution part configured to eject at least two source materials onto a substrate through routes different from each other and a second gas distribution part configured to eject a source material having a decomposition temperature greater than an average of decomposition temperatures of the at least two source materials onto the substrate. The first gas distribution part is divided into at least two sections and disposed such that the second gas distribution part is positioned therebetween; and couplable and separable to/from one another.
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Citations
27 Claims
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1. A gas distribution apparatus comprising:
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a first gas distribution part configured to eject at least two source materials onto a substrate through routes different from each other; and a second gas distribution part configured to eject a source material having a decomposition temperature greater than an average of decomposition temperatures of the at least two source materials onto the substrate, wherein the first gas distribution part is divided into at least two sections and disposed such that the second gas distribution part is positioned therebetween; and
couplable and separable to/from one another. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A substrate treating apparatus comprising:
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a chamber comprising a reaction space; a substrate seat unit disposed in the reaction space of the chamber to radially seat a plurality of substrates with respect to a center thereof; and a gas distribution device comprising a first gas distribution part configured to eject at least two source materials onto a substrate through routes different from each other and a second gas distribution part configured to eject a source material having a decomposition temperature greater than an average of decomposition temperatures of the at least two source materials onto the substrate, wherein the first gas distribution part is divided into at least two sections, and the divided first gas distribution parts are disposed such that the second gas distribution part is positioned therebetween; and
couplable and separable to/from one another. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25, 26, 27)
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Specification