STRUCTURE FOR HIGH VOLTAGE DEVICE AND CORRESPONDING INTEGRATION PROCESS
First Claim
1. Structure for a high voltage device of the type which comprises at least a semiconductor substrate being covered by an epitaxial layer of a first type of conductivity, wherein a plurality of column structures are realized, which column structures comprise high aspect ratio deep trenches, said epitaxial layer being in turn covered by an active surface area wherein said high voltage device is realized, wherein each of the column structures comprises at least an external portion being in turn realized by a silicon epitaxial layer of a second type of conductivity, opposed than said first type of conductivity and having a dopant charge which counterbalances the dopant charge being in said epitaxial layer outside said column structures, as well as a dielectric filling portion which is realized inside said external portion in order to completely fill said deep trench.
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Abstract
An embodiment of a structure for a high voltage device of the type which comprises at least a semiconductor substrate being covered by an epitaxial layer of a first type of conductivity, wherein a plurality of column structures are realized, which column structures comprises high aspect ratio deep trenches, said epitaxial layer being in turn covered by an active surface area wherein said high voltage device is realized, each of the column structures comprising at least an external portion being in turn realized by a silicon epitaxial layer of a second type of conductivity, opposed than said first type of conductivity and having a dopant charge which counterbalances the dopant charge being in said epitaxial layer outside said column structures, as well as a dielectric filling portion which is realized inside said external portion in order to completely fill said deep trench.
18 Citations
70 Claims
- 1. Structure for a high voltage device of the type which comprises at least a semiconductor substrate being covered by an epitaxial layer of a first type of conductivity, wherein a plurality of column structures are realized, which column structures comprise high aspect ratio deep trenches, said epitaxial layer being in turn covered by an active surface area wherein said high voltage device is realized, wherein each of the column structures comprises at least an external portion being in turn realized by a silicon epitaxial layer of a second type of conductivity, opposed than said first type of conductivity and having a dopant charge which counterbalances the dopant charge being in said epitaxial layer outside said column structures, as well as a dielectric filling portion which is realized inside said external portion in order to completely fill said deep trench.
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24. Integration process of a structure for a high voltage device of the type which comprises the steps of:
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realizing a semiconductor substrate having a first conductivity type; epitaxially growing on said semiconductor substrate an epitaxial layer having said first conductivity type; and realizing in said epitaxial layer at least one deep trench having a high aspect ratio in order to realize at least one column structure in said epitaxial layer; an epitaxial growing step within said trench of a silicon layer being doped and having a second conductivity type, opposed than said first conductivity type and having a dopant charge which counterbalances a dopant charge being in said epitaxial layer outside said column structures and a filling step of said trench by means of a filling dielectric layer in order to realize a filling portion of said at least one column structure. - View Dependent Claims (25, 26, 27, 28, 29, 30)
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31. A structure, comprising:
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a semiconductor layer having a first conductivity; a first semiconductor region extending into the semiconductor layer and having a second conductivity; and a first insulator region extending into the semiconductor region. - View Dependent Claims (32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57)
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58. An integrated circuit, comprising:
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a semiconductor layer having a first conductivity; and an electronic device, comprising; a first semiconductor region extending into the semiconductor layer and having a second conductivity; and a first insulator region extending into the semiconductor region.
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59. A system, comprising:
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a first integrated circuit, comprising; a semiconductor layer having a first conductivity; and an electronic device, comprising; a first semiconductor region extending into the semiconductor layer and having a second conductivity; and a first insulator region extending into the semiconductor region; and a second integrated circuit coupled to the first integrated circuit. - View Dependent Claims (60, 61, 62)
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63. A method, comprising:
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forming a first trench in a first semiconductor layer having a first conductivity; lining a wall of the first trench with a second semiconductor layer having a second conductivity; and forming a first insulator region in the lined first trench. - View Dependent Claims (64, 65, 66, 67, 68, 69, 70)
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Specification