THIN FILM TRANSISTOR MANUFACTURING METHOD, THIN FILM TRANSISTOR, THIN FILM TRANSISTOR SUBSTRATE AND IMAGE DISPLAY APPARATUS, IMAGE DISPLAY APPARATUS AND SEMICONDUCTOR DEVICE
First Claim
1. A method for producing a thin film transistor comprising the steps of:
- a film-forming step in which an amorphous oxide film is formed;
a patterning step in which said amorphous oxide film is patterned by etching; and
a crystallization step in which said amorphous oxide film which is patterned in the patterning step is crystallized, wherein said crystallized crystalline oxide film is allowed to be a channel layer.
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Accused Products
Abstract
To provide a method for producing a thin film transistor improved in stability, uniformity, reproducibility, heat resistance, durability or the like, a thin film transistor, a thin film transistor substrate, an image display apparatus, an image display apparatus and a semiconductor device.
In the semiconductor device, a crystalline oxide is used as an N-type transistor and the electron carrier concentration of the crystalline oxide is less than 2×1017/cm3. Furthermore, the crystalline oxide is a polycrystalline oxide containing In and one or more positive divalent elements selected from Zn, Mg, Cu, Ni, Co and Ca, and the atomic ratio In [In] and the positive divalent element [X][X]/([X]+[In]) is 0.0001 to 0.13.
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Citations
39 Claims
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1. A method for producing a thin film transistor comprising the steps of:
- a film-forming step in which an amorphous oxide film is formed;
a patterning step in which said amorphous oxide film is patterned by etching; and
a crystallization step in which said amorphous oxide film which is patterned in the patterning step is crystallized, wherein said crystallized crystalline oxide film is allowed to be a channel layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 38, 39)
- a film-forming step in which an amorphous oxide film is formed;
- 19. An active matrix type image display apparatus provided with a light control element and a field-effect type transistor for driving said light control element, wherein an active layer of said field-effect type transistor is a crystalline oxide and the electron carrier concentration of said active layer is less than 2×
- 26. A semiconductor device using a crystalline oxide as an N-type semiconductor, wherein the electron carrier concentration of said crystalline oxide is less than 2×
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