METHOD OF MANUFACTURING PATTERNED SUBTRATE FOR CULTURING CELLS, PATTERNED SUBTRATE FOR CULTURING CELLS, PATTERNING METHOD OF CULTURING CELLS, AND PATTERNED CELL CHIP

• US 20110053800A1
• Filed: 08/31/2010
• Published: 03/03/2011
• Est. Priority Date: 09/01/2009
• Status: Abandoned Application

• Current Assignee: SungKyunKwan University (SKKU)
• Original Assignee: Sungkyunkwan University Foundation For Corporate Collaboration (SungKyunKwan University (SKKU))
• Inventors: Kim, Kyung Seop, Choi, Chang Rok, Jung, Dong Geun
• Application Number:
  US12/872,903
• Publication Number:
  US 20110053800A1
• Time in Patent Office: Days
• US Class Current: 506/14
• CPC Class Codes: B01J 2219/00509 Microcolumns
• CPC Class Codes: B01J 2219/00527 Sheets
• CPC Class Codes: B01J 2219/00605 the compounds being directly bound or immobilised to solid supports
• CPC Class Codes: B01J 2219/00612 the surface being inorganic
• CPC Class Codes: B01J 2219/00614 Delimitation of the attachment areas
• CPC Class Codes: B01J 2219/00619 using hydrophilic or hydrophobic regions
• CPC Class Codes: B01J 2219/00621 by physical means, e.g. trenches, raised areas
• CPC Class Codes: B01J 2219/00635 by reactive plasma treatment
• CPC Class Codes: B01J 2219/00637 by coating it with another layer
• CPC Class Codes: B01J 2219/00743 Cells
• CPC Class Codes: C12N 2533/12 Glass
• CPC Class Codes: C12N 2533/30 Synthetic polymers thermoreactive polymers, e.g. PNIPAm, C12N2539/10
• CPC Class Codes: C12N 2535/10 Patterned coating
• CPC Class Codes: C12N 5/0068 General culture methods using substrates for specific animal cell type C12N5/06

Abstract

The present invention relates to a method of manufacturing a patterned substrate for culturing cells, comprising the steps of: (1) preparing a substrate; (2) forming a first plasma polymer layer by integrating a first precursor material using a plasma on the substrate; (3) placing a shadow mask having a predetermined pattern on the first plasma polymer layer; and (4) forming a second patterned plasma polymer layer by integrating a second precursor material using a plasma.

Claims

1. A method of manufacturing a patterned substrate for culturing cells, comprising the steps of:

(1) preparing a substrate;

(2) forming a first plasma polymer layer by integrating a first precursor material using a plasma on the substrate;

(3) placing a shadow mask having a predetermined pattern on the first plasma polymer layer; and

(4) forming a second patterned plasma polymer layer by integrating a second precursor material using a plasma.

2. The method according to claim 1, further comprising the step of forming the first patterned plasma polymer layer by integrating the first precursor material using a plasma between steps (3) and (4).

3. The method according to claim 1, wherein the substrate is selected from the group consisting of glass, plastic, metal and silicone.

4. The method according to claim 1, wherein the first precursor material is selected from the group consisting of styrene and n-hexane.

5. The method according to claim 1, wherein the first precursor material is selected from the group consisting of siloxane-based compounds, including hexamethyldisiloxane, octamethyltrisiloxane, decamethyltetrasiloxane, hexa methylcyclotrisiloxane, octamethyl cyclotetrasiloxane, and decamethylcyclopentasiloxane.

6. The method according to claim 5, wherein the first precursor material is a siloxane-based compound, and the siloxane-based compound is hexamethyldisiloxane.

7. The method according to claim 1, wherein the second precursor material is selected from the group consisting of ethylenediamine, acetonitrile, allylamine, propylamine, cycloheptane, cyclohexane, and cyclopentane.

8. The method according to claim 1, wherein the first plasma polymer layer is formed by plasma enhanced chemical vapor deposition in step (2), and the second plasma polymer layer is formed by inductively coupled plasma enhanced chemical vapor deposition in step (4).

9. The method according to claim 1, wherein the first precursor material and the second precursor material are vaporized at the temperature of 30°

C. to 70°

C., and plasma-deposited.

10. The method according to claim 1, wherein the predetermined pattern of the shadow mask is provided with a plurality of holes having a diameter of 200 μ

m, and a space between the holes is 200 μ

m.

11. A patterned substrate for culturing cells, which is manufactured by the method of claim 1.

12. A patterning method for culturing cells, comprising the steps of:

preparing a substrate for culturing cells which is patterned by the method of claim 1; and

culturing cells on the patterned substrate for culturing cells.

13. The method according to claim 12, wherein the cell is selected from the group consisting of microorganisms, cells and organs of animal/plant, neural cells, and endothelial cells.

14. A patterned cell chip, wherein cells are cultured on the patterned substrate for culturing cells manufactured by the method of any one of claim 1.

15. The patterned cell chip according to claim 14, wherein the cell is selected from the group consisting of microorganisms, cells and organs of animal/plant, neural cells, and endothelial cells.