METHOD FOR TREATING SURFACES, LAMP FOR SAID METHOD, AND IRRADIATION SYSTEM HAVING SAID LAMP
First Claim
1. A method for surface treatment, in particular cleaning, modification and/or activation, of an object in the interior of a process chamber (17) with the aid of a UV/VUV radiator (1),the UV/VUV radiator (1) having a radiator vessel (2) that projects into the interior of the process chamber (17),the method comprising the following method steps:
- introducing into the process chamber (17) the object whose surface is to be treated, in particular cleaned, modified and/or activated,generating UV/VUV radiation by operating the UV/VUV radiator (1), the UV/VUV radiation passing into the interior of the process chamber (17) through the wall of the radiator vessel (2), which wall is transparent to the UV/VUV radiation,characterized by the following additional method step;
generating a gas discharge in the region of at least a part (7) of the outer wall of the radiator vessel (2).
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Accused Products
Abstract
The invention relates to a method for treating, particularly cleaning, modifying, and/or activating surfaces, using UV/VUV irradiation of a UV/VUV lamp and additional gas discharge. A dielectric barrier discharge lamp (1) is preferably used as the UV/VUV lamp, comprising a planar window segment (7) for emitting the UV/VUV radiation. The lamp (1) extends into a process chamber (17). The additional gas discharge is generated in the region of the outer side of the window segment (7) of the lamp (1). The substrate to be treated is disposed within the process chamber (17), near the window segment (7).
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Citations
20 Claims
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1. A method for surface treatment, in particular cleaning, modification and/or activation, of an object in the interior of a process chamber (17) with the aid of a UV/VUV radiator (1),
the UV/VUV radiator (1) having a radiator vessel (2) that projects into the interior of the process chamber (17), the method comprising the following method steps: -
introducing into the process chamber (17) the object whose surface is to be treated, in particular cleaned, modified and/or activated, generating UV/VUV radiation by operating the UV/VUV radiator (1), the UV/VUV radiation passing into the interior of the process chamber (17) through the wall of the radiator vessel (2), which wall is transparent to the UV/VUV radiation, characterized by the following additional method step; generating a gas discharge in the region of at least a part (7) of the outer wall of the radiator vessel (2). - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification