Stable surface wave plasma source
First Claim
1. A surface wave plasma (SWP) source, comprising:
- an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of said EM wave launcher adjacent said plasma, said EM wave launcher comprises a slot antenna having a plurality of slots formed therethrough configured to couple said EM energy from a first region above said slot antenna to a second region below said slot antenna;
a resonator plate positioned in said second region and having a lower surface of said resonator plate including said plasma surface of the EM wave launcher;
a first recess configuration formed in said plasma surface, said first recess configuration substantially aligned with a first arrangement of slots in said plurality of slots;
a second recess configuration formed in said plasma surface, said second recess configuration either partly aligned with a second arrangement of slots in said plurality of slots or not aligned with said second arrangement of slots in said plurality of slots; and
a power coupling system coupled to said EM wave launcher and configured to provide said EM energy to said EM wave launcher for forming said plasma.
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Abstract
A surface wave plasma (SWP) source is described. The SWP source comprises an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent the plasma. The EM wave launcher comprises a slot antenna having a plurality of slots. The SWP source further comprises a first recess configuration formed in the plasma surface, wherein the first recess configuration is substantially aligned with a first arrangement of slots in the plurality of slots, and a second recess configuration formed in the plasma surface, wherein the second recess configuration is either partly aligned with a second arrangement of slots in the plurality of slots or not aligned with the second arrangement of slots in the plurality of slots. A power coupling system is coupled to the EM wave launcher and configured to provide the EM energy to the EM wave launcher for forming the plasma.
36 Citations
20 Claims
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1. A surface wave plasma (SWP) source, comprising:
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an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of said EM wave launcher adjacent said plasma, said EM wave launcher comprises a slot antenna having a plurality of slots formed therethrough configured to couple said EM energy from a first region above said slot antenna to a second region below said slot antenna; a resonator plate positioned in said second region and having a lower surface of said resonator plate including said plasma surface of the EM wave launcher; a first recess configuration formed in said plasma surface, said first recess configuration substantially aligned with a first arrangement of slots in said plurality of slots; a second recess configuration formed in said plasma surface, said second recess configuration either partly aligned with a second arrangement of slots in said plurality of slots or not aligned with said second arrangement of slots in said plurality of slots; and a power coupling system coupled to said EM wave launcher and configured to provide said EM energy to said EM wave launcher for forming said plasma. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A surface wave plasma (SWP) source, comprising:
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an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma in a process space by generating a surface wave on a plasma surface of said EM wave launcher adjacent said plasma, said EM wave launcher comprises a slot antenna having a plurality of slots formed therethrough configured to couple said EM energy from a first region above said slot antenna to a second region below said slot antenna, and a resonator plate positioned in said second region and having a lower surface of said resonator plate including said plasma surface of the EM wave launcher; a first recess configuration formed in said plasma surface, said first recess configuration substantially aligned with a first arrangement of slots in said plurality of slots; means for stabilizing said plasma for a pressure in said process space ranging from about 2 mtorr to about 1 torr, said means for stabilizing said plasma being formed in said plasma surface of said resonator plate; means for uniformly generating said plasma in said process space; and a power coupling system coupled to said EM wave launcher and configured to provide said EM energy to said EM wave launcher for forming said plasma.
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20. A surface wave plasma (SWP) source, comprising:
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an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of said EM wave launcher adjacent said plasma, said EM wave launcher comprises a slot antenna having a substantially circular geometry and having a plurality of slots formed therethrough configured to couple said EM energy from a first region above said slot antenna to a second region below said slot antenna, wherein said plurality of slots comprises a first plurality of slots located at a substantially peripheral region of said slot antenna and a second plurality of slots located at a substantially central and/or mid-radius region of said slot antenna; a resonator plate positioned in said second region and having a lower surface of said resonator plate including said plasma surface of the EM wave launcher; a first recess configuration formed in said plasma surface, said first recess configuration substantially aligned with said first plurality of slots; a second recess configuration formed in said plasma surface, said second recess configuration is fully aligned with said second plurality of slots, partly aligned with said second plurality of slots, or not aligned with said second plurality of slots; and a power coupling system coupled to said EM wave launcher and configured to provide said EM energy to said EM wave launcher for forming said plasma.
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Specification