LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
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Abstract
An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the liquid supply system.
80 Citations
43 Claims
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1-23. -23. (canceled)
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24. A lithographic apparatus, comprising:
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an exposure station arranged such that exposure of a substrate takes place through a liquid; a measurement station arranged such that measurement of a substrate takes place through a liquid; and a first and a second moveable substrate table that are each configured to hold a substrate, each of the first and the second moveable substrate table moveable between the exposure station and the measurement station so that exposure of a substrate held by the first moveable substrate table at the exposure station takes place during measurement of another substrate held by the second moveable substrate table at the measurement station. - View Dependent Claims (25, 26, 27, 28, 29, 30, 31, 32, 33, 34)
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35. A device manufacturing method comprising:
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exposing a first substrate at an exposure station by projecting a patterned beam of radiation on the first substrate through a liquid; and measuring a second substrate at a measurement station, the measurement taking place through a liquid, wherein the measurement of the second substrate occurs during exposure of the first substrate. - View Dependent Claims (36, 37, 38, 39, 40, 41, 42, 43)
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Specification