METHODS FOR FORMING LAYERS WITHIN A MEMS DEVICE USING LIFTOFF PROCESSES
First Claim
1. An electromechanical device, comprising:
- an electrode layer located over a substrate;
a conductive movable layer located over the conductive layer, wherein at least a portion of the conductive movable layer is spaced apart from the electrode layer by an air gap;
at least one support structure located adjacent the conductive movable layer, wherein an outer periphery of the support structure comprises an outwardly tapered edge.
1 Assignment
0 Petitions
Accused Products
Abstract
Certain MEMS devices include layers patterned to have tapered edges. One method for forming layers having tapered edges includes the use of an etch leading layer. Another method for forming layers having tapered edges includes the deposition of a layer in which the upper portion is etchable at a faster rate than the lower portion. Another method for forming layers having tapered edges includes the use of multiple iterative etches. Another method for forming layers having tapered edges includes the use of a liftoff mask layer having an aperture including a negative angle, such that a layer can be deposited over the liftoff mask layer and the mask layer removed, leaving a structure having tapered edges.
-
Citations
20 Claims
-
1. An electromechanical device, comprising:
-
an electrode layer located over a substrate; a conductive movable layer located over the conductive layer, wherein at least a portion of the conductive movable layer is spaced apart from the electrode layer by an air gap; at least one support structure located adjacent the conductive movable layer, wherein an outer periphery of the support structure comprises an outwardly tapered edge. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
-
-
13. A method of fabricating an electromechanical device, the method comprising:
-
forming an electrode layer over a substrate; forming a sacrificial layer over the electrode layer; forming a conductive movable layer over the sacrificial layer; forming a mask having at least one aperture extending therethrough, the mask having a negative angle at the edge of the at least one aperture; depositing a layer of support structure material over the mask and the at least one aperture; and removing the mask to form a support structure. - View Dependent Claims (14, 15, 16)
-
-
17. An electromechanical device, comprising:
-
an electrode layer located over a substrate; a conductive movable layer located over the conductive layer, wherein at least a portion of the conductive movable layer is spaced apart from the electrode layer by an air gap; at least one support structure located adjacent the conductive movable layer, wherein the at least one support structure comprises means for facilitating conformal deposition of an overlying layer. - View Dependent Claims (18, 19, 20)
-
Specification