PATTERN CHARACTERISTIC-DETECTION APPARATUS FOR PHOTOMASK AND PATTERN CHARACTERISTIC-DETECTION METHOD FOR PHOTOMASK
First Claim
1. A pattern characteristic detection apparatus for a photomask comprising:
- a detection-data creating portion configured to create detection data on the basis of an optical image of a pattern formed on a photomask;
a reference-data creating portion configured to create reference data of the pattern;
an extracting portion configured to extract, from the reference data, a pattern for pattern characteristic detection and positional information of the extracted pattern;
a first area-setting portion configured to set an area where pattern characteristics are to be detected on the basis of the extracted pattern, and configured to extract, from the detection data, a target pattern for the pattern characteristic detection on the basis of the positional information of the extracted pattern;
a detecting portion configured to detect pattern characteristics of the target pattern for the pattern characteristic detection within the area where the pattern characteristics are to be detected by converting light intensity of an optical image formed on a CCD image sensor into electric digital signal; and
an collecting portion configured to collect the detected pattern characteristics.
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Accused Products
Abstract
According to one embodiment, a pattern characteristic detection apparatus for a photomask includes a detection-data creating portion, a reference-data creating portion, an extracting portion, a first area-setting portion, a detecting portion and an collecting portion. The detection-data creating portion is configured to create detection data on the basis of an optical image of a pattern formed on a photomask. The reference-data creating portion is configured to create reference data of the pattern. The extracting portion is configured to extract a pattern for pattern characteristic detection and positional information of the extracted pattern. The first area-setting portion is configured to set an area where pattern characteristics are to be detected, and configured to extract a target pattern. The detecting portion is configured to detect pattern characteristics of the target pattern within the area. In addition, the collecting portion is configured to collect the detected pattern characteristics.
12 Citations
20 Claims
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1. A pattern characteristic detection apparatus for a photomask comprising:
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a detection-data creating portion configured to create detection data on the basis of an optical image of a pattern formed on a photomask; a reference-data creating portion configured to create reference data of the pattern; an extracting portion configured to extract, from the reference data, a pattern for pattern characteristic detection and positional information of the extracted pattern; a first area-setting portion configured to set an area where pattern characteristics are to be detected on the basis of the extracted pattern, and configured to extract, from the detection data, a target pattern for the pattern characteristic detection on the basis of the positional information of the extracted pattern; a detecting portion configured to detect pattern characteristics of the target pattern for the pattern characteristic detection within the area where the pattern characteristics are to be detected by converting light intensity of an optical image formed on a CCD image sensor into electric digital signal; and an collecting portion configured to collect the detected pattern characteristics. - View Dependent Claims (2, 3, 4)
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5. A pattern characteristic detection apparatus for a photomask comprising:
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a detection-data creating portion configured to create detection data on the basis of an optical image of a pattern formed on a photomask; a reference-data creating portion configured to create reference data of the pattern; an extracting portion configured to extract, from the reference data, a pattern for pattern characteristic detection and positional information of the extracted pattern; an inverse-transforming portion configured to perform an inverse-transformation operation to calculate, from the detection data of a pattern formed on a photomask; a wafer plane pattern computing portion configured to calculate a wafer plane pattern from the pattern formed on the photomask. a second area-setting portion configured to set an area where pattern characteristics are to be detected on the basis of the extracted pattern, and configured to extract, from the wafer plane pattern, a target pattern for the pattern characteristic detection on the basis of the positional information of the extracted pattern; a detecting portion configured to detect pattern characteristics of the target pattern for the pattern characteristic detection within the area where the pattern characteristics are to be detected; and an collecting portion configured to collect the detected pattern characteristics. - View Dependent Claims (6, 7, 8, 9)
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10. A pattern characteristic detection apparatus for a photomask comprising:
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a detection-data creating portion configured to create detection data on the basis of an optical image of a pattern formed on a photomask; a reference-data creating portion configured to create reference data of the pattern; an extracting portion configured to extract, from the reference data a pattern for pattern characteristic detection and positional information of the extracted pattern; a transforming portion configured to calculate the pattern formed on a photomask from the detection data by calculating a pattern that correlates most with the detection data by a correlation operation; a wafer plane pattern computing portion configured to calculate a wafer plane pattern from the pattern formed on the photomask. a second area-setting portion configured to set an area where pattern characteristics are to be detected on the basis of the extracted pattern, and configured to extract, from the wafer plane pattern a target pattern for the pattern characteristic detection on the basis of the positional information of the extracted pattern; a detecting portion configured to detect pattern characteristics of the target pattern for the pattern characteristic detection within the area where the pattern characteristics are to be detected; and an collecting portion configured to collect the detected pattern characteristics. - View Dependent Claims (11, 12, 13, 14)
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15. A method of detecting pattern characteristics of a photomask comprising:
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creating detection data on the basis of an optical image of a pattern formed on a photomask; creating reference data of the pattern; extracting, from the reference data, a pattern for pattern characteristic detection and positional information of the extracted pattern; setting an area where pattern characteristics are to be detected on the basis of the extracted pattern, and extracting, from the detection data, a target pattern for the pattern characteristic detection on the basis of the positional information of the extracted pattern; detecting pattern characteristics of the target pattern for the characteristic detection within the area where the pattern characteristics are to be detected; and collecting the detected pattern characteristics. - View Dependent Claims (16, 17)
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18. A method of detecting pattern characteristics of a photomask comprising:
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creating detection data on the basis of an optical image of a pattern formed on a photomask; creating reference data of the pattern; extracting, from the reference data, a pattern for pattern characteristic detection and positional information of the extracted pattern; performing an inverse-transformation operation to calculate, from the detection data, a pattern formed on a photomask; calculating a wafer plane pattern from the pattern formed on the photomask; setting an area where pattern characteristics are to be detected on the basis of the extracted pattern, and extracting, from the wafer plane pattern, the target pattern for the characteristic detection on the basis of the positional information of the extracted pattern; detecting pattern characteristics of the target pattern for the characteristic detection within the area where the pattern characteristics are to be detected; and collecting the detected pattern characteristics. - View Dependent Claims (19, 20)
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Specification