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PATTERN CHARACTERISTIC-DETECTION APPARATUS FOR PHOTOMASK AND PATTERN CHARACTERISTIC-DETECTION METHOD FOR PHOTOMASK

  • US 20110058729A1
  • Filed: 08/17/2010
  • Published: 03/10/2011
  • Est. Priority Date: 09/09/2009
  • Status: Active Grant
First Claim
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1. A pattern characteristic detection apparatus for a photomask comprising:

  • a detection-data creating portion configured to create detection data on the basis of an optical image of a pattern formed on a photomask;

    a reference-data creating portion configured to create reference data of the pattern;

    an extracting portion configured to extract, from the reference data, a pattern for pattern characteristic detection and positional information of the extracted pattern;

    a first area-setting portion configured to set an area where pattern characteristics are to be detected on the basis of the extracted pattern, and configured to extract, from the detection data, a target pattern for the pattern characteristic detection on the basis of the positional information of the extracted pattern;

    a detecting portion configured to detect pattern characteristics of the target pattern for the pattern characteristic detection within the area where the pattern characteristics are to be detected by converting light intensity of an optical image formed on a CCD image sensor into electric digital signal; and

    an collecting portion configured to collect the detected pattern characteristics.

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