Please download the dossier by clicking on the dossier button x
×

SYSTEMS AND METHODS FOR THIN-FILM DEPOSITION OF METAL OXIDES USING EXCITED NITROGEN-OXYGEN SPECIES

  • US 20110070380A1
  • Filed: 08/11/2010
  • Published: 03/24/2011
  • Est. Priority Date: 08/14/2009
  • Status: Active Grant
First Claim
Patent Images

1. A method for depositing a film on a substrate that is within a reaction chamber, the method comprising applying an atomic layer deposition cycle to the substrate, the cycle comprising:

  • exposing the substrate to a precursor gas for a precursor pulse interval then removing the precursor gas thereafter; and

    exposing the substrate to an oxidizer comprising an oxidant gas and a nitrogen-containing species gas for an oxidation pulse interval then removing the oxidizer thereafter.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×