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LASER ABLATION TOOLING VIA DISTRIBUTED PATTERNED MASKS

  • US 20110070398A1
  • Filed: 09/18/2009
  • Published: 03/24/2011
  • Est. Priority Date: 09/18/2009
  • Status: Abandoned Application
First Claim
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1. A distributed patterned mask for use in imaging a laser onto a substrate, comprising:

  • a mask having apertures for transmission of light and non-transmissive areas around the apertures, wherein the apertures collectively form a distributed portion of a complete pattern, and wherein when the apertures in the mask are repeatedly imaged onto the substrate, structures within the distributed portion merge within different areas of the imaged pattern to create the complete pattern on the substrate with distributed stitch lines.

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