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INTERSPINOUS PROCESS IMPLANT HAVING A COMPLIANT SPACER

  • US 20110077686A1
  • Filed: 09/29/2009
  • Published: 03/31/2011
  • Est. Priority Date: 09/29/2009
  • Status: Abandoned Application
First Claim
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1. An apparatus, comprising:

  • a proximal portion;

    a distal portion;

    a spacer between the proximal portion and the distal portion and configured to be disposed in a space between adjacent spinous processes, the spacer defining a lumen therethrough;

    a layer of material disposed along an outer surface of the spacer such that the layer has a first thickness in the areas adjacent to the spinous process and a second thickness in areas remote from the spinous processes; and

    a central body configured to be disposed at least partially within the lumen of the spacer, the central body being movable axially relative to the spacer wherein such axial movement moves the spacer between a collapsed configuration and an deployed configuration.

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