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DUAL MODE INDUCTIVELY COUPLED PLASMA REACTOR WITH ADJUSTABLE PHASE COIL ASSEMBLY

  • US 20110097901A1
  • Filed: 06/23/2010
  • Published: 04/28/2011
  • Est. Priority Date: 10/26/2009
  • Status: Abandoned Application
First Claim
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1. A dual mode inductively coupled plasma processing system, comprising:

  • a process chamber having a dielectric lid; and

    a plasma source assembly disposed above the dielectric lid, the plasma source assembly comprising;

    a plurality of coils configured to inductively couple RF energy into the process chamber to form and maintain a plasma therein;

    a phase controller coupled to the plurality of coils for controlling the relative phase of RF current applied to each coil in the plurality of coils; and

    an RF generator coupled to the phase controller.

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