MULTIPLE-SIDED CMP PAD CONDITIONING DISK

• US 20110097977A1
• Filed: 08/07/2009
• Published: 04/28/2011
• Est. Priority Date: 08/07/2009
• Status: Abandoned Application

• Current Assignee: Abrasive Technology, Inc.
• Original Assignee: Abrasive Technology, Inc.
• Inventors: Bubnick, Mark L., Namola, Thomas S. JR.
• Application Number:
  US12/537,456
• Publication Number:
  US 20110097977A1
• Time in Patent Office: Days
• US Class Current: 451/56
• CPC Class Codes: B24B 53/017 Devices or means for dressing, cleaning or otherwise conditioning lapping tools
• CPC Class Codes: B24B 53/12 Dressing tools; Holders therefor

Abstract

A conditioning tool for restoring a used CMP polishing pad to an operable condition. The tool includes a base that attaches to a driven machine and has a surface from which a shoulder protrudes that receives a peripheral edge of a disk. The disk has two opposing surfaces, each of which is substantially planar and has abrasive mounted thereon. The disk'"'"'s peripheral edge is held in place between the base shoulder and a ring that has a shoulder that is complementary to the disk'"'"'s peripheral edge. The ring is fastened to the base with the abrasive of the first disk surface protruding through an aperture in the ring, and the opposing disk surface spaced from the base'"'"'s surface. After the disk'"'"'s first surface is worn, the disk can be turned around to expose the opposite surface'"'"'s abrasive to a CMP pad.

Claims

1. A conditioning tool for restoring a used CMP polishing pad to an operable condition, comprising:

(a) a substrate having a peripheral edge and a first substantially planar major surface with a first abrasive mounted thereon and at least a second, oppositely facing, substantially planar major surface with a second abrasive mounted thereon;

(b) a base for drivingly linking to a rotatably driven machine, the base having a base surface; and

(c) at least one fastener mounting the substrate to the base with the second abrasive spaced from the base surface to form a gap between the base surface and the second abrasive, and the first abrasive facing away from the base.

2. The conditioning tool in accordance with claim 1, wherein said at least one fastener is mounted at a central region of the substrate and the base, wherein said central region of the substrate has no abrasive mounted thereon.

3. The conditioning tool in accordance with claim 2, wherein said at least one fastener extends through the substrate into the base.

4. The conditioning tool in accordance with claim 1, wherein the substrate is a disk with a circular peripheral edge.

5. The conditioning tool in accordance with claim 4, wherein said at least one fastener mounts a ring to the base with the disk held between the ring and the base by a clamping force applied to the disk, the first abrasive protrudes through an aperture of the ring that is smaller than the disk, the base has a first substrate-shaped void in which the substrate is mounted and the ring has a second substrate-shaped void in which the disk is mounted.

6. The conditioning tool in accordance with claim 5, wherein the first substrate-shaped void is defined by a circular shoulder extending from the base surface, a shoulder diameter being substantially equal to a diameter of the circular peripheral edge of the disk and receiving at least a portion of the peripheral edge of the disk.

7. The conditioning tool in accordance with claim 6, wherein the second substrate-shaped void is defined by a ring body having a circular shoulder defining an aperture having a diameter that is smaller than the diameter of the peripheral edge of the disk, the ring shoulder diameter being substantially equal to the diameter of the peripheral edge of the disk and receiving at least a portion of the peripheral edge of the disk.

8. The conditioning tool in accordance with claim 7, wherein said at least one fastener mounts the ring to the base with the disk held between the ring and the base by a clamping force applied to the peripheral edge of the disk by the ring shoulder and the base shoulder.

9. The conditioning tool in accordance with claim 8, further comprising a key inserted into notches formed in the disk and at least one of the ring and the base for preventing relative movement of the disk and the base.

10. The conditioning tool in accordance with claim 4, wherein said at least one fastener mounts a ring to the base, a groove in the ring defining first and second substrate-shaped voids retains the disk in the ring, and the first abrasive protrudes through an aperture of the ring that is smaller than the disk.

11. The conditioning tool in accordance with claim 10, wherein the first substrate-shaped void is defined by a first circular shoulder formed in the ring, a first shoulder diameter being substantially equal to a diameter of the circular peripheral edge of the disk and receiving at least a portion of the peripheral edge of the disk, and wherein the second substrate-shaped void is defined by a second circular shoulder formed in the ring opposing the first circular shoulder and defining an aperture having a diameter that is smaller than the diameter of the circular peripheral edge of the disk, the second circular shoulder diameter being substantially equal to the diameter of the peripheral edge of the disk and receiving at least a portion of the peripheral edge of the disk.

12. The conditioning tool in accordance with claim 11, wherein the ring further comprises a first ring portion removably mounted to a second ring portion and configured to receive the disk.

13. The conditioning tool in accordance with claim 12, further comprising a key inserted into notches formed in the disk and the ring for preventing relative movement of the disk and the base.

14. An improved conditioning tool for restoring a used CMP polishing pad to an operable condition including a disk with a circular peripheral edge and a first substantially planar surface to which a first abrasive is attached and a drive mount for drivingly linking to a rotatably driven machine, the improvement comprising:

(a) the disk having a second, opposing substantially planar surface to which a second abrasive is attached, thereby forming two opposing, substantially planar abrasive surfaces;

(b) a base on which the drive mount is formed, the base having a circular shoulder extending from a base surface substantially opposite the drive mount, a base shoulder diameter being substantially equal to a diameter of the circular peripheral edge of the disk and receiving at least a portion of the peripheral edge of the disk;

(c) a ring having an annular body with a circular shoulder defining an aperture having a diameter that is smaller than the diameter of the peripheral edge of the disk, the ring shoulder diameter being substantially equal to the diameter of the peripheral edge of the disk and receiving at least a portion of the peripheral edge of the disk; and

(d) at least one fastener mounting the ring to the base with the disk held between the ring and the base by a clamping force applied to the peripheral edge of the disk by the ring shoulder and the base shoulder, wherein the first abrasive protrudes through the aperture of the ring, and the second abrasive is spaced from the base surface.

15. The conditioning tool in accordance with claim 14, wherein said at least one fastener mounts the ring to the base with the disk held between the ring and the base by a clamping force applied to the peripheral edge of the disk by the ring shoulder and the base shoulder.

16. The conditioning tool in accordance with claim 15, further comprising a key inserted into notches formed in the disk and at least one of the ring and the base for preventing relative movement of the disk and the base.

17. A conditioning tool for restoring a used CMP polishing pad to an operable condition, comprising:

(a) a disk having a circular peripheral edge, a first substantially planar surface to which a first abrasive is attached and a second, opposing substantially planar surface to which a second abrasive is attached, thereby forming two opposing, substantially planar abrasive surfaces, the circular peripheral edge including a first surface and a second surface;

(b) a base for drivingly linking to a rotatably driven machine, the base having a circular shoulder extending from a base surface, a shoulder diameter being substantially equal to a diameter of the circular peripheral edge of the disk and receiving the first surface of the peripheral edge of the disk;

(c) a ring having an annular body with a circular shoulder defining an aperture having a diameter that is smaller than the diameter of the peripheral edge of the disk, the ring shoulder diameter being substantially equal to the diameter of the peripheral edge of the disk and receiving the second surface of the peripheral edge of the disk; and

(d) at least one fastener mounting the ring to the base with the disk held between the ring and the base by a clamping force applied to the peripheral edge of the disk by the ring shoulder and the base shoulder, wherein the first abrasive protrudes through the aperture of the ring, and the second abrasive is spaced from the base surface.

18. The conditioning tool in accordance with claim 17, wherein said at least one fastener mounts the ring to the base with the disk held between the ring and the base by a clamping force applied to the peripheral edge of the disk by the ring shoulder and the base shoulder.

19. The conditioning tool in accordance with claim 18, further comprising a key inserted into notches formed in the disk and at least one of the ring and the base for preventing relative movement of the disk and the base.

20. A conditioning tool for restoring a used CMP polishing pad to an operable condition, comprising:

(a) a substrate having a peripheral edge and a first substantially planar major surface with a first abrasive mounted thereon and at least a second, oppositely facing, substantially planar major surface with a second abrasive mounted thereon;

(b) a base for drivingly linking to a rotatably driven machine, the base having a base surface; and

(c) means for mounting the substrate to the base with the second abrasive spaced from the base surface to form a gap between the base surface and the second abrasive, and the first abrasive faces away from the base.

21. The conditioning tool in accordance with claim 20, wherein the substrate is a disk with a circular peripheral edge.

22. A method of restoring a used CMP polishing pad to an operable condition, the method comprising:

(b) drivingly linking a base to a rotatably driven machine, the base having a circular shoulder extending from a base surface, a shoulder diameter being substantially equal to a diameter of the circular peripheral edge of the disk;

(a) disposing a circular peripheral edge of a disk against the base'"'"'s shoulder, the disk having a first substantially planar surface to which a first abrasive is attached and a second, opposing substantially planar surface to which a second abrasive is attached, thereby forming two opposing, substantially planar abrasive surfaces; and

(c) mounting a ring to the base, the ring having an annular body with a circular shoulder defining an aperture having a diameter that is smaller than the diameter of the peripheral edge of the disk, the ring shoulder diameter being substantially equal to the diameter of the peripheral edge of the disk and receiving at least a portion of the peripheral edge of the disk;

(d) clamping the disk between the ring and the base by a clamping force applied to the peripheral edge of the disk by the ring shoulder and the base shoulder, wherein the first abrasive protrudes through the aperture of the ring, and the second abrasive is spaced from the base surface.

23. The method in accordance with claim 22, further comprising inserting a key into notches formed in the disk and at least one of the ring and the base for preventing relative movement of the disk and the base.

24. A conditioning tool for restoring a used CMP polishing pad to an operable condition, comprising:

(a) a disk having a circular peripheral edge, a first substantially planar surface to which a first abrasive is attached and a second, opposing substantially planar surface to which a second abrasive is attached, thereby forming two opposing, substantially planar abrasive surfaces, the circular peripheral edge including a first surface that faces toward a second surface;

(b) a base for drivingly linking to a rotatably driven machine, the base having a circular shoulder extending from a base surface, a shoulder diameter being substantially equal to a diameter of the circular peripheral edge of the disk and receiving the first surface of the peripheral edge of the disk;

(c) a ring having an annular body with a circular shoulder defining an aperture having a diameter that is smaller than the diameter of the peripheral edge of the disk, the ring shoulder diameter being substantially equal to the diameter of the peripheral edge of the disk and receiving the second surface of the peripheral edge of the disk; and

(d) at least one fastener mounting the ring to the base with the disk held between the ring and the base, wherein the first abrasive protrudes through the aperture of the ring, and the second abrasive is spaced from the base surface.

25. A holder for a conditioning tool for restoring a used CMP polishing pad to an operable condition, the holder comprising:

(a) a base for drivingly linking to a rotatably driven machine, the base having a circular shoulder extending from a base surface configured to receive a disk having

(i) a circular peripheral edge including a first surface and a second surface;

(ii) a first substantially planar surface to which a first abrasive is attached; and

(iii) a second, opposing substantially planar surface to which a second abrasive is attached, thereby forming two opposing, substantially planar abrasive surfaces, a shoulder diameter being substantially equal to a diameter of the circular peripheral edge of the disk for receiving the first surface of the peripheral edge of the disk;

(b) a ring having an annular body with a circular shoulder defining an aperture having a diameter that is smaller than the diameter of the peripheral edge of the disk, the ring shoulder diameter being substantially equal to the diameter of the peripheral edge of the disk for receiving the second surface of the peripheral edge of the disk; and

(c) at least one fastener for mounting the ring to the base with the disk held between the ring and the base by a clamping force applied to the peripheral edge of the disk by the ring shoulder and the base shoulder, wherein the first abrasive protrudes through the aperture of the ring, and the second abrasive is spaced from the base surface.