SEMICONDUCTOR DEVICE
First Claim
1. A semiconductor device, comprising:
- a first base layer of a first conductivity type;
a plurality of second base layers of a second conductivity type provided on a part of a first surface of the first base layer;
a plurality of trenches formed entire between the second base layers adjacent to each other, widths of the trenches being wider than those of the second base layers, and depths of the trenches being deeper than those of the second base layers;
an emitter layer formed along one of the trenches on a surface of one of the second base layers;
a collector layer of the second conductivity type, provided below a second surface of the first base layer opposite to the first surface;
a plurality of insulating films formed on inside surfaces of the trenches; and
a space section including at least a gate electrode formed within one of the trenches, and isolated from the second base layers and the emitter layer by the insulating film.
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Accused Products
Abstract
A semiconductor device comprises a first base layer of a first conductivity type; a plurality of second base layers of a second conductivity type, provided on a part of a first surface of the first base layer; trenches formed on each side of the second base layers, and formed to be deeper than the second base layers; an emitter layer formed along the trench on a surface of the second base layers; a collector layer of the second conductivity type, provided on a second surface of the first base layer opposite to the first surface; an insulating film formed on an inner wall of the trench, the insulating film being thicker on a bottom of the trench than on a side surface of the trench; a gate electrode formed within the trench, and isolated from the second base layers and the emitter layer by the insulating film; and a space section provided between the second base layers adjacent to each other, the space section being deeper than the second base layers and being electrically isolated from the emitter layer and the second base layers.
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Citations
15 Claims
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1. A semiconductor device, comprising:
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a first base layer of a first conductivity type; a plurality of second base layers of a second conductivity type provided on a part of a first surface of the first base layer; a plurality of trenches formed entire between the second base layers adjacent to each other, widths of the trenches being wider than those of the second base layers, and depths of the trenches being deeper than those of the second base layers; an emitter layer formed along one of the trenches on a surface of one of the second base layers; a collector layer of the second conductivity type, provided below a second surface of the first base layer opposite to the first surface; a plurality of insulating films formed on inside surfaces of the trenches; and a space section including at least a gate electrode formed within one of the trenches, and isolated from the second base layers and the emitter layer by the insulating film. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A semiconductor device, comprising:
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a first base layer of a first conductivity type; a plurality of second base layers of a second conductivity type provided on a part of a first surface of the first base layer; a plurality of trenches formed on both sides of the second base layers; an emitter layer formed along one of the trenches on a surface of the second base layers; a collector layer of the second conductivity type provided below a second surface of the first base layer opposite to the first surface; a plurality of insulating films formed on inside surfaces of the trenches; a plurality of gate electrodes formed along side surfaces of each trench, and isolated from the second base layers and the emitter layer by the insulating films; and a plurality of intervention insulating films filled between the gate electrodes in each trench. - View Dependent Claims (10, 11, 12, 13, 14, 15)
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Specification