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Apparatus and Method of Measuring a Property of a Substrate

  • US 20110102753A1
  • Filed: 04/20/2009
  • Published: 05/05/2011
  • Est. Priority Date: 04/21/2008
  • Status: Active Grant
First Claim
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1. An inspection apparatus configured to determine a property of a substrate, comprising:

  • a radiation source configured to output a radiation beam, the radiation beam directed to a surface of the substrate;

    a collimator configured to collimate and focus the radiation beam once reflected from the surface of the substrate, and to separate diffraction orders of the reflected radiation beam; and

    a detector configured to detect a spectrum of the reflected radiation beam,wherein the property of the substrate is determined by measuring a property of the spectrum in a plane positioned in a range from where the radiation beam is converging toward an image plane of the collimator to where the radiation beam is diverging from the image plane.

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