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METHOD FOR FABRICATING MICRO-ELECTRO-MECHANICAL SYSTEM (MEMS) DEVICE

  • US 20110104844A1
  • Filed: 04/29/2008
  • Published: 05/05/2011
  • Est. Priority Date: 04/29/2008
  • Status: Active Grant
First Claim
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1. A method for fabricating micro-electro-mechanical system (MEMS) device, comprising:

  • providing a substrate, having a first side and a second side;

    forming a structural dielectric layer over the substrate at the first side, wherein a structural conductive layer is embedded in the structural dielectric layer;

    performing a multi-stage patterning process on the substrate from the second side, wherein a plurality of regions of the substrate with different levels is formed and a portion of the structural dielectric layer is exposed; and

    performing an isotropic etching process from the second side of the substrate or from the both side of the substrate to etch the structural dielectric layer, wherein a remaining portion of the structural dielectric layer comprises the structural conductive layer and a dielectric portion enclosed by the structural conductive layer.

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