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Sidewall Image Transfer Using the Lithographic Stack as the Mandrel

  • US 20110111596A1
  • Filed: 11/06/2009
  • Published: 05/12/2011
  • Est. Priority Date: 11/06/2009
  • Status: Active Grant
First Claim
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1. A method comprising:

  • providing a structure comprising at least one lithographic layer on a substrate, where the at least one lithographic layer comprises a planarization layer (PL);

    forming a sacrificial mandrel by patterning at least a portion of the at least one lithographic layer using a photolithographic process, where the sacrificial mandrel comprises at least a portion of the PL; and

    producing at least one microstructure by using the sacrificial mandrel in a sidewall image transfer process.

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