PLASMA SOURCE DESIGN
First Claim
1. A plasma source coupled to a processing chamber, comprising:
- a core element having a first end, a second end and a core element central axis;
a first plasma block having one or more surfaces that at least partially enclose a first annular shaped plasma generating region, wherein the first annular shaped plasma generating region is disposed around a first portion of the core element; and
a coil disposed over a portion of the core element.
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Abstract
Embodiments of the present invention generally provide a plasma source apparatus, and method of using the same, that is able to generate radicals and/or gas ions in a plasma generation region that is symmetrically positioned around a magnetic core element by use of an electromagnetic energy source. In general, the orientation and shape of the plasma generation region and magnetic core allows for the effective and uniform coupling of the delivered electromagnetic energy to a gas disposed in the plasma generation region. In general, the improved characteristics of the plasma formed in the plasma generation region is able to improve deposition, etching and/or cleaning processes performed on a substrate or a portion of a processing chamber that is disposed downstream of the plasma generation region.
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Citations
25 Claims
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1. A plasma source coupled to a processing chamber, comprising:
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a core element having a first end, a second end and a core element central axis; a first plasma block having one or more surfaces that at least partially enclose a first annular shaped plasma generating region, wherein the first annular shaped plasma generating region is disposed around a first portion of the core element; and a coil disposed over a portion of the core element. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A plasma source coupled to a processing chamber, comprising:
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a core element comprising a first end, a second end and a core element central axis; a first plasma block having one or more surfaces that at least partially enclose a first annular shaped plasma generating region, wherein the first annular shaped plasma generating region is disposed around a first portion of the core element and has a central axis that is generally coincident with the core element central axis; a second plasma block having one or more surfaces that at least partially enclose a second annular shaped plasma generating region, wherein the second annular shaped plasma generating region is disposed around a second portion of the core element and has a central axis that is generally coincident with the core element central axis; and a coil disposed over a portion of the core element. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19)
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20. A method of forming energetic gas atoms, comprising:
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flowing a process gas into a first annular shaped plasma generating region that is at least partially enclosed by one or more surfaces of a first plasma block, wherein the first annular shaped plasma generating region is disposed around a portion of a core element; and generating a plasma in the first annular shaped plasma generating region by delivering RF power to a coil wound around a portion of the core element.
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21. A plasma source coupled to a processing chamber, comprising:
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a core element having a first end, a second end and a core element central axis; a first plasma block having one or more surfaces that at least partially enclose a first annular shaped plasma generating region, wherein the first annular shaped plasma generating region is disposed around a first portion of the core element; a first coil disposed over a first portion of the core element; and a second coil disposed over a second portion of the core element, wherein the first plasma block is disposed between the first portion of the core element and second portion of the core element. - View Dependent Claims (22, 23, 24, 25)
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Specification