PLASMA SOURCE DESIGN

• US 20110115378A1
• Filed: 10/15/2010
• Published: 05/19/2011
• Est. Priority Date: 11/18/2009
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Miller, Matthew, Chuc, Kien, Pinson, Jay, Yang, Jang-Gyoo, Lubomirsky, Dmitry
• Granted Patent: US 8,742,665 B2
• Time in Patent Office: Days
• US Class Current: 315/111.21
• CPC Class Codes: H01J 37/3211 Antennas, e.g. particular shapes of coils
• CPC Class Codes: H01J 37/32357 Generation remote from the workpiece, e.g. down-stream

Abstract

Embodiments of the present invention generally provide a plasma source apparatus, and method of using the same, that is able to generate radicals and/or gas ions in a plasma generation region that is symmetrically positioned around a magnetic core element by use of an electromagnetic energy source. In general, the orientation and shape of the plasma generation region and magnetic core allows for the effective and uniform coupling of the delivered electromagnetic energy to a gas disposed in the plasma generation region. In general, the improved characteristics of the plasma formed in the plasma generation region is able to improve deposition, etching and/or cleaning processes performed on a substrate or a portion of a processing chamber that is disposed downstream of the plasma generation region.

Claims

1. A plasma source coupled to a processing chamber, comprising:

a core element having a first end, a second end and a core element central axis;

a first plasma block having one or more surfaces that at least partially enclose a first annular shaped plasma generating region, wherein the first annular shaped plasma generating region is disposed around a first portion of the core element; and

a coil disposed over a portion of the core element.

2. The plasma source of claim 1, further comprising:

a wall of the processing chamber has a first inlet that is in fluid communication with the first annular shaped plasma generating region, and a second inlet that is in fluid communication with a second annular shaped plasma generating region that is disposed around a second portion of the core element, wherein the first and second inlets are both in fluid communication with a processing region of the processing chamber.

3. The plasma source of claim 2, wherein the first portion of the core element has a first diameter and the second portion of the core element has a second diameter, wherein the first diameter and the second diameter are different.

4. The plasma source of claim 1, further comprising:

a housing having an inlet and an outlet, wherein the core element is disposed within an internal region of the housing; and

a heat exchanging assembly that is configured to cause a temperature controlled fluid to flow through the inlet, the internal region and the outlet of the housing.

5. The plasma source of claim 1, further comprising:

an actuator that is configured to move the core element relative to the first annular shaped plasma generating region.

6. The plasma source of claim 1, wherein the first plasma block comprises a material selected from the group consisting of aluminum oxide (Al₂O₃), aluminum nitride (AlN), beryllium oxide (BeO) and boron nitride (BN).

7. The plasma source of claim of claim 1, wherein the coil is disposed over a portion the core element at the first end or at a mid-position disposed between the first and second ends.

8. The plasma source of claim 1, further comprising a plurality of permanent magnets that are disposed between the core element and the first annular shaped plasma generating region.

9. The plasma source of claim 1, further comprising:

an RF power source coupled to the coil; and

a plasma redistribution coil disposed around at least a portion of the first annular shaped plasma generating region and coupled to a DC power source.

10. The plasma source of claim 1, wherein the core element has a bar shape.

11. The plasma source of claim 1, further comprising:

an electrode disposed adjacent to the first annular shaped plasma generating region; and

a first power source electrically coupled to the coil and the electrode.

12. A plasma source coupled to a processing chamber, comprising:

a core element comprising a first end, a second end and a core element central axis;

a first plasma block having one or more surfaces that at least partially enclose a first annular shaped plasma generating region, wherein the first annular shaped plasma generating region is disposed around a first portion of the core element and has a central axis that is generally coincident with the core element central axis;

a second plasma block having one or more surfaces that at least partially enclose a second annular shaped plasma generating region, wherein the second annular shaped plasma generating region is disposed around a second portion of the core element and has a central axis that is generally coincident with the core element central axis; and

a coil disposed over a portion of the core element.

13. The plasma source of claim 12, further comprising a cooling plate coupled to a surface of the first plasma block.

14. The plasma source of claim 12, further comprising:

a first gas outlet formed in the first plasma block, wherein the first gas outlet is configured to receive gas radicals formed in the first annular shaped plasma generating region and deliver the gas radicals to a processing region of the processing chamber; and

a second gas outlet formed in the second plasma block, wherein the second gas outlet is configured to receive gas radicals formed in the second annular shaped plasma generating region and deliver the gas radicals to the processing region of the processing chamber.

15. The plasma source of claim 12, further comprising:

a housing having an inlet and an outlet, wherein the core element is disposed within an internal region of the housing; and

a heat exchanging assembly that is configured to cause a temperature controlled fluid to flow through the inlet, the internal region and the outlet of the housing.

16. The plasma source of claim 12, further comprising:

an actuator that is configured to move the core element relative to the first annular shaped plasma generating region; and

a system controller that is configured to automatically adjust the position of the core element relative to the first annular shaped plasma generating region.

17. The plasma source of claim 12, wherein the first plasma block and the second plasma block each comprise a material selected from the group consisting of aluminum oxide (Al₂O₃), aluminum nitride (AlN), beryllium oxide (BeO) and boron nitride (BN).

18. The plasma source of claim of claim 12, wherein the coil is disposed over a portion the core element at the first end or at a mid-position disposed between the first and second ends.

19. The plasma source of claim 12, further comprising:

An RF power source coupled to the coil that is disposed over a portion of the core element; and

a plasma redistribution coil disposed around at least a portion of the first annular shaped plasma generating region and coupled to a DC power source.

20. A method of forming energetic gas atoms, comprising:

flowing a process gas into a first annular shaped plasma generating region that is at least partially enclosed by one or more surfaces of a first plasma block, wherein the first annular shaped plasma generating region is disposed around a portion of a core element; and

generating a plasma in the first annular shaped plasma generating region by delivering RF power to a coil wound around a portion of the core element.