Detection and Mitigation of Particle Contaminants in MEMS Devices
First Claim
1. A method for detecting particle contaminants in integrated circuit device having a device structure and a sense node adjacent to the device structure, the method comprising:
- during a test mode;
setting impedance of the sense node to a predetermined test mode impedance higher than a predetermined operational mode impedance for the sense node;
placing a test signal on the device structure; and
monitoring the sense node for leakage current from the device structure; and
during an operational mode;
setting impedance of the sense node to the predetermined operational mode impedance.
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Accused Products
Abstract
Detecting and/or mitigating the presence of particle contaminants in a MEMS device involves including MEMS structures that in normal operation are robust against the presence of particles but which can be made sensitive to that presence during a test mode prior to use, e.g., by switching the impedance of sensitive structures between an exceptionally sensitive condition during test and a normal sensitivity during operation; surrounding sensitive nodes with guard elements that are at the same potential as those nodes during operation, thereby offering protection against bridging particles, but are at a very different potential during test and reveal the particles by their resulting leakage currents; extending the sensitive nodes to interdigitate with or otherwise extend adjacent to the guard structures, which neither contribute to nor detract from the device operation but cover otherwise open areas with detection means during test; and/or converting benign areas in which particles might become trapped undetectably by electric fields during test to field-free regions by extending otherwise non-functional conductive layers so that the particles can then be moved into detection locations by providing some mechanical disturbance.
22 Citations
24 Claims
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1. A method for detecting particle contaminants in integrated circuit device having a device structure and a sense node adjacent to the device structure, the method comprising:
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during a test mode; setting impedance of the sense node to a predetermined test mode impedance higher than a predetermined operational mode impedance for the sense node; placing a test signal on the device structure; and monitoring the sense node for leakage current from the device structure; and during an operational mode; setting impedance of the sense node to the predetermined operational mode impedance. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. An integrated circuit device comprising:
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a device structure; a sense node adjacent to the device structure; and a particle detecting controller coupled to the device structure and the sense node, the particle detecting controller comprising; a test mode in which the controller sets impedance of the sense node to a predetermined test mode impedance higher than a predetermined operational mode impedance for the sense node, places a test signal on the device structure, and monitors the sense node for leakage current from the device structure; and an operational mode in which the controller sets impedance of the sense node to the predetermined operational mode impedance. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
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17. A MEMS device comprising:
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a fixed sense electrode; a guard structure adjacent to the fixed sense electrode; and a controller coupled to the fixed sense electrode and the guard structure, the controller comprising; a test mode in which the controller places the guard structure at a different electrical potential than the fixed sense electrode and monitors the fixed sense electrode for leakage current from the guard structure; and an operational mode in which the controller places the guard structure at the same electrical potential as the fixed sense electrode. - View Dependent Claims (18, 19, 20, 21, 22)
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23. A MEMS device comprising:
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a substrate supporting a set of device structures; a conductive shield layer partially covering a surface of the substrate and leaving an uncovered potential trap region; a conductive gate layer embedded within the substrate, the conductive gate layer having a first extended portion underlying the potential trap region; and a controller coupled to the conductive shield layer and the conductive gate layer and configured to place the same electrical potential on both the conductive shield layer and the conductive gate layer. - View Dependent Claims (24)
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Specification