Semiconductor Device and Manufacturing Method Thereof
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Abstract
An object is to provide a semiconductor device of which a manufacturing process is not complicated and by which cost can be suppressed, by forming a thin film transistor using an oxide semiconductor film typified by zinc oxide, and a manufacturing method thereof. For the semiconductor device, a gate electrode is formed over a substrate; a gate insulating film is formed covering the gate electrode; an oxide semiconductor film is formed over the gate insulating film; and a first conductive film and a second conductive film are formed over the oxide semiconductor film. The oxide semiconductor film has at least a crystallized region in a channel region.
739 Citations
84 Claims
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1-38. -38. (canceled)
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39. A semiconductor device comprising:
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a gate electrode; a gate insulating film adjacent to the gate electrode; an oxide semiconductor layer including a channel region adjacent to the gate electrode with the gate insulating film therebetween, the oxide semiconductor layer having crystallinity; and wherein the channel region is substantially intrinsic. - View Dependent Claims (40, 41, 42, 43, 44)
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45. A semiconductor device comprising:
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a gate electrode; a gate insulating film adjacent to the gate electrode; an oxide semiconductor layer including a channel region adjacent to the gate electrode with the gate insulating film therebetween, the oxide semiconductor layer having crystallinity; a source electrode and a drain electrode in electrical contact with the oxide semiconductor layer; and a pixel electrode electrically connected to one of the source electrode and the drain electrode, wherein the channel region is substantially intrinsic. - View Dependent Claims (46, 47, 48, 49, 50, 51, 52)
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53. A semiconductor device comprising:
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a gate electrode; a gate insulating film over the gate electrode; an oxide semiconductor layer including a channel region over the gate electrode with the gate insulating film therebetween, the oxide semiconductor layer having crystallinity; and wherein the channel region is substantially intrinsic. - View Dependent Claims (54, 55, 56, 57, 58)
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59. A semiconductor device including a transistor comprising:
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a gate electrode; a gate insulating film adjacent to the gate electrode; an oxide semiconductor layer including a channel region adjacent to the gate electrode with the gate insulating film therebetween, the oxide semiconductor layer having crystallinity; and wherein the channel region is substantially intrinsic, and wherein the transistor is a top gate type transistor. - View Dependent Claims (60, 61, 62, 63, 64)
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65. A semiconductor device comprising:
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a gate electrode; a gate insulating film adjacent to the gate electrode; an oxide semiconductor layer including a channel region adjacent to the gate electrode with the gate insulating film therebetween, the oxide semiconductor layer including indium and having crystallinity; and wherein the channel region is substantially intrinsic. - View Dependent Claims (66, 67, 68, 69)
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70. A semiconductor device comprising:
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a gate electrode; a gate insulating film adjacent to the gate electrode; an oxide semiconductor layer including a channel region adjacent to the gate electrode with the gate insulating film therebetween, the oxide semiconductor layer including indium and having crystallinity; a source electrode and a drain electrode in electrical contact with the oxide semiconductor layer; and a pixel electrode electrically connected to one of the source electrode and the drain electrode, wherein the channel region is substantially intrinsic. - View Dependent Claims (71, 72, 73, 74)
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75. A semiconductor device comprising:
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a gate electrode; a gate insulating film over the gate electrode; an oxide semiconductor layer including a channel region over the gate electrode with the gate insulating film therebetween, the oxide semiconductor layer including indium and having crystallinity; and wherein the channel region is substantially intrinsic. - View Dependent Claims (76, 77, 78, 79)
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80. A semiconductor device including a transistor comprising:
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a gate electrode; a gate insulating film adjacent to the gate electrode; an oxide semiconductor layer including a channel region adjacent to the gate electrode with the gate insulating film therebetween, the oxide semiconductor layer including indium and having crystallinity; and wherein the channel region is substantially intrinsic, and wherein the transistor is a top gate type transistor. - View Dependent Claims (81, 82, 83, 84)
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Specification