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Projection exposure apparatus, projection exposure method, and method for producing device

  • US 20110122377A1
  • Filed: 01/28/2011
  • Published: 05/26/2011
  • Est. Priority Date: 09/29/2003
  • Status: Active Grant
First Claim
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1. A projection exposure apparatus which transfers a pattern formed on a mask onto a substrate through a liquid, the projection exposure apparatus comprising:

  • an optical member which projects an image of the pattern onto the substrate; and

    an electricity removal device which removes electricity from the liquid to be supplied to a space between the optical member and a surface of the substrate by adding an additive to the liquid to suppress the liquid from being charged.

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