SUBSTRATE PROCESSING APPARATUS
First Claim
1. A substrate processing apparatus, comprising:
- a vacuum container;
a rotary table to rotate in the vacuum container;
a substrate placement member mounted on the rotary table in a detachable manner, the substrate placement member and the rotary table together providing a recess in which a substrate is placed on an upper side of the rotary table, and the substrate placement member constituting a bottom surface in the recess on which the substrate is placed;
a position regulating unit provided at least one of the rotary table and the substrate placement member to regulate a movement of the substrate caused by a centrifugal force during rotation of the rotary table;
a reactant gas supply unit to supply reactant gas to the upper side of the rotary table; and
a vacuum exhaust unit to exhaust the vacuum container.
1 Assignment
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Accused Products
Abstract
A substrate processing apparatus includes a vacuum container, a rotary table to rotate in the vacuum container, a substrate placement member mounted on the rotary table in a detachable manner, the substrate placement member and the rotary table together providing a recess in which a substrate is placed on an upper side of the rotary table, and the substrate placement member constituting a bottom surface in the recess on which the substrate is placed, a position regulating unit provided at least one of the rotary table and the substrate placement member to regulate a movement of the substrate caused by a centrifugal force during rotation of the rotary table, a reactant gas supply unit to supply reactant gas to the upper side of the rotary table, and a vacuum exhaust unit to exhaust the vacuum container.
170 Citations
5 Claims
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1. A substrate processing apparatus, comprising:
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a vacuum container; a rotary table to rotate in the vacuum container; a substrate placement member mounted on the rotary table in a detachable manner, the substrate placement member and the rotary table together providing a recess in which a substrate is placed on an upper side of the rotary table, and the substrate placement member constituting a bottom surface in the recess on which the substrate is placed; a position regulating unit provided at least one of the rotary table and the substrate placement member to regulate a movement of the substrate caused by a centrifugal force during rotation of the rotary table; a reactant gas supply unit to supply reactant gas to the upper side of the rotary table; and a vacuum exhaust unit to exhaust the vacuum container. - View Dependent Claims (2, 3, 4, 5)
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Specification