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HIGH INFRARED REFLECTION COATINGS, THIN FILM COATING DEPOSITION METHODS AND ASSOCIATED TECHNOLOGIES

  • US 20110128617A1
  • Filed: 02/09/2011
  • Published: 06/02/2011
  • Est. Priority Date: 10/11/2005
  • Status: Active Grant
First Claim
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1. A substrate having a major surface that bears a low-emissivity coating, the coating comprising a first infrared-reflection film region having a thickness, a second infrared-reflection film region having a thickness, and a third infrared-reflection film region having a thickness, where the thickness of the third infrared-reflection film region is greater than the thickness of the second infrared-reflection film region, and the thickness of the second infrared-reflection film region is greater than the thickness of the first infrared-reflection film region, the coating comprising, from said major surface outwardly:

  • a) a first transparent dielectric film region;

    b) the first infrared-reflection film region;

    c) a second transparent dielectric film region;

    d) the second infrared-reflection film region;

    e) a third transparent dielectric film region;

    f) the third infrared-reflection film region;

    g) a fourth transparent dielectric film region;

    wherein the first, second, and third infrared-reflection film regions each comprise silver, wherein the coating has a first reflection-region ratio equal to the thickness of the first infrared-reflection film region over the thickness of the second infrared-reflection film region, the coating has a second reflection-region ratio equal to the thickness of the second infrared-reflection film region over the thickness of the third infrared-reflection film region, and wherein at least one of said first and second reflection-region ratios is less than 0.85.

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