BRAIN ELECTRODE

• US 20110131808A1
• Filed: 02/02/2011
• Published: 06/09/2011
• Est. Priority Date: 02/28/2001
• Status: Active Grant

• Current Assignee: Medtronic Incorporated (Medtronic Plc)
• Original Assignee: Medtronic Incorporated (Medtronic Plc)
• Inventors: Gill, Steven Streatfield
• Granted Patent: US 8,442,653 B2
• Time in Patent Office: Days
• US Class Current: 29/885
• CPC Class Codes: A61N 1/0534 Electrodes for deep brain stimulation
• CPC Class Codes: Y10T 29/49224 with coating

Abstract

An electrode, in particular a deep brain stimulating (DBS) electrode or a deep brain lesioning electrode, a method for manufacturing an electrode and use of the electrode, and a directional electrode.

Claims

1. A method for constructing an implantable medical lead comprising:

winding one or more insulated wires around a support member to form a core, the one or more insulated wires each having first and second ends and each having a metallic core, wherein the first and second ends of the one or more insulated wires are radially extended from the support member;

coating the core with an insulating sheath such that the first and second radially extending ends of the one or more insulated wires are not coated by the sheath;

cutting the one or more insulated wires flush with the sheath to remove the first and second ends such that the metallic cores of the one or more insulated wires are exposed at the surface of the sheath; and

depositing electrically conducting material on the surface of the sheath such that the electrically conducting material is contacted with the exposed metallic cores of the one or more insulated wires at the surface of the sheath to form one or more electrode areas.

2. The method of claim 1, wherein winding the one or more insulated wires around the support member comprises winding the one or more insulating wires around a tungsten wire.

3. The method of claim 1, wherein depositing the electrically conducting material on the surface of the sheath comprises deposition by a process selected from the group consisting of jet printing, etching, photolithography, plasma deposition, evaporation and electroplating.

4. The method of claim 1, wherein the electrically conducting material is deposited on the surface of the sheath such the one or more electrode areas are formed as directional electrodes.

5. The method of claim 4, wherein the directional electrodes extends over less that half of the circumference of the sheath.

6. The method of claim 1, further comprising removing the support member after the electrically conductive material is deposited on the sheath.

7. A method for constructing an implantable medical lead comprising:

coating a core comprising one or more insulated wires with an insulating sheath, the one or more insulated wires each having first and second ends and each having a metallic core, the core configured such that the first and second ends of the one or more insulated wires radially extend from the core, wherein the core is coated such that the first and second radially extending ends of the one or more insulated wires are not coated by the sheath;

cutting the one or more insulated wires flush with the sheath to remove the first and second ends such that the metallic cores of the one or more insulated wires are exposed at the surface of the sheath; and

depositing electrically conducting material on the surface of the sheath such that the electrically conducting material is contacted with the exposed metallic cores of the one or more insulated wires at the surface of the sheath to form one or more electrode areas.

8. The method of claim 7, wherein the core comprises the one or more insulated wires wound around a support member to produce the core.

9. The method of claim 8, wherein the support member is a tungsten wire.

10. The method of claim 7, wherein depositing the electrically conducting material on the surface of the sheath comprises deposition by a process selected from the group consisting of jet printing, etching, photolithography, plasma deposition, evaporation and electroplating.

11. The method of claim 7, wherein the electrically conducting material is deposited on the surface of the sheath such the one or more electrode areas are formed as directional electrodes.

12. The method of claim 11, wherein the directional electrodes extend over less than half of the circumference of the sheath.

13. The method of claim 11, wherein the directional electrodes extend over less than a quarter of the circumference of the sheath.

14. The method of claim 11, wherein the directional electrodes extend over about an eighth of the circumference of the sheath.

15. The method of claim 7, wherein the electrically conducting material is deposited on the surface of the sheath such the one or more electrode areas have a length of 1.5 mm to 3 mm and a width of 0.2 mm to 0.5 mm.

16. A method for constructing an implantable medical lead comprising:

depositing electrically conducting material on the surface of a sheath to form an electrode area, wherein the electrically conducting material is deposited such that the electrically conducting material is contacted with an exposed metallic core of insulated wire that is flush with the surface of the sheath.

17. The method of claim 16, wherein depositing the electrically conducting material on the surface of the sheath comprises deposition by a process selected from the group consisting of jet printing, etching, photolithography, plasma deposition, evaporation and electroplating.

18. The method of claim 16, wherein the sheath is coated on a core comprising the insulated wire wound around a support member, and further comprising removing the support member after the electrically conducting member is deposited on the surface of the sheath.

19. The method of claim 18, wherein the electrically conducting material is deposited on the sheath to form a directional electrode that extends over less that half of the circumference of the sheath.

20. The method of claim 16, wherein the electrically conducting material is deposited on the surface of the sheath such the electrode area has a length of 1.5 mm to 3 mm and a width of 0.2 mm to 0.5 mm.