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SEMICONDUCTOR DEVICE

  • US 20110133196A1
  • Filed: 12/01/2010
  • Published: 06/09/2011
  • Est. Priority Date: 12/04/2009
  • Status: Active Grant
First Claim
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1. A semiconductor device comprising:

  • a gate electrode;

    a gate insulating film over the gate electrode;

    an oxide semiconductor film over the gate insulating film; and

    a source electrode and a drain electrode over the oxide semiconductor film,wherein a value of an activation energy of the oxide semiconductor film is greater than or equal to 0 meV and less than or equal to 25 meV.

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