SHIELDED GATE TRENCH MOSFET WITH INCREASED SOURCE-METAL CONTACT
First Claim
1-1. he semiconductor device of claim 1, wherein the source region has a substantially vertical surface, and at least a portion of the substantially vertical surface is in physical contact with the metal layer.
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Accused Products
Abstract
A semiconductor device formed on a semiconductor substrate having a substrate top surface, includes: a gate trench extending from the substrate top surface into the semiconductor substrate; a gate electrode in the gate trench; a dielectric material disposed over the gate electrode; a body region adjacent to the gate trench; a source region embedded in the body region, at least a portion of the source region extending above the dielectric material; a contact trench that allows contact such as electrical contact between the source region and the body region; and a metal layer disposed over at least a portion of a gate trench opening, at least a portion of the source region, and at least a portion of the contact trench.
54 Citations
22 Claims
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1-1. he semiconductor device of claim 1, wherein the source region has a substantially vertical surface, and at least a portion of the substantially vertical surface is in physical contact with the metal layer.
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11. A method for fabricating a semiconductor device, comprising:
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forming a gate trench; forming a gate electrode within the gate trench; forming a gate top dielectric material over the top of the gate electrode; forming a body region and a source region; forming a contact trench; etching back the gate top dielectric material such that at least a portion of the source is region extends above the gate top dielectric material; and depositing a metal layer over at least a portion of a gate trench opening, at least a portion of the source region, and at least a portion of the contact trench. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22)
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12-2. he method of claim 12, further comprising forming an inter-electrode dielectric between the shield electrode and the gate electrode.
Specification