APPARATUS FOR GENERATING PLASMA
First Claim
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1. An apparatus for generating plasma, the apparatus comprising:
- a vacuum chamber comprising a through-hole at a center of its top; and
a plasma source part, comprising;
a dielectric part configured to protrude upward along a circumference of the through-hole;
an upper electrode coupled to seal an opened top of the dielectric part, the upper electrode configured to receive a supply of a Radio Frequency (RF) power; and
an inductive coil configured to;
spirally extend along an outer circumference surface of the dielectric part; and
receive a supply of the RF power,the plasma source part being configured to generate plasma within the vacuum chamber.
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Abstract
An apparatus for generating plasma is provided. The apparatus may include a vacuum chamber and a plasma source part. The plasma source part may include a dielectric part, an upper electrode, and an inductive coil. The dielectric part may be installed to protrude upward along a circumference of a through-hole provided at a top of the vacuum chamber. The upper electrode may be coupled to seal an opened top of the dielectric part. The inductive coil may spirally extend along an outer circumference surface of the dielectric part.
120 Citations
19 Claims
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1. An apparatus for generating plasma, the apparatus comprising:
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a vacuum chamber comprising a through-hole at a center of its top; and a plasma source part, comprising; a dielectric part configured to protrude upward along a circumference of the through-hole; an upper electrode coupled to seal an opened top of the dielectric part, the upper electrode configured to receive a supply of a Radio Frequency (RF) power; and an inductive coil configured to; spirally extend along an outer circumference surface of the dielectric part; and receive a supply of the RF power, the plasma source part being configured to generate plasma within the vacuum chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. An apparatus for generating plasma, the apparatus comprising:
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a vacuum chamber opened at its top; a first dielectric part comprising a through-hole in its partial region, the first dielectric part configured to cover the opened top of the vacuum chamber; and a plasma source part comprising; a second dielectric part configured to protrude upward along a circumference of the through-hole; an upper electrode coupled to seal an opened top of the second dielectric part, the upper electrode configured to receive a supply of a Radio Frequency (RF) power; a center inductive coil configured to; spirally extend along an outer circumference surface of the second dielectric part; and receive a supply of the RF power; and an edge inductive coil configured to; spirally extend along a circumference of the center inductive coil at a set distance from the center inductive coil; and receive a supply of the RF power, the plasma source part being configured to generate plasma within the vacuum chamber. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17)
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18. An apparatus for generating plasma, the apparatus comprising:
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a vacuum chamber opened at its top; a first dielectric part comprising a through-hole in its partial region, the first dielectric part configured to cover the opened top of the vacuum chamber; and a plasma source part comprising; a second dielectric part configured to protrude upward along a circumference of the through-hole; an upper electrode coupled to seal an opened top of the second dielectric part and grounded; a center inductive coil configured to; spirally extend along an outer circumference surface of the second dielectric part; and receive a supply of a Radio Frequency (RF) power; and an edge inductive coil configured to; spirally extend along a circumference of the center inductive coil at a set distance from the center inductive coil; and receive a supply of the RF power, the plasma source part being configured to generate plasma within the vacuum chamber. - View Dependent Claims (19)
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Specification