EXPOSURE APPARATUS, LIQUID IMMERSION MEMBER, AND DEVICE MANUFACTURING METHOD
First Claim
1. An exposure apparatus that exposes an object with an energy beam via an optical member and a liquid, the apparatus comprising:
- a liquid immersion member which is placed facing the object on an outer periphery side of a beam path of the energy beam, and on a first surface to which the object is placed opposing, a first recess section to form an auxiliary liquid immersion space between the object and the liquid immersion member is formed; and
a first liquid supply system which supplies the liquid inside the liquid immersion member to form a liquid immersion space between the optical member and the object.
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Accused Products
Abstract
Liquid is held between a tip lens of a projection optical system and a wafer on a wafer stage, using a nozzle member which has shape enclosing an optical path of an illumination light, and a bottom surface to which wafer W is placed facing via a predetermined clearance that has an annular recess section formed having multiple projecting sections. This prevents adhesion of contamination and liquid from remaining that become factors of defects of a pattern formed on a wafer. The nozzle member preferably has an annular shaped inclined surface whose gap with the wafer surface becomes smaller from the inner side to the outer side, formed on an inner bottom surface facing the wafer of an outer recess section formed on the bottom surface of the nozzle member.
46 Citations
137 Claims
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1. An exposure apparatus that exposes an object with an energy beam via an optical member and a liquid, the apparatus comprising:
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a liquid immersion member which is placed facing the object on an outer periphery side of a beam path of the energy beam, and on a first surface to which the object is placed opposing, a first recess section to form an auxiliary liquid immersion space between the object and the liquid immersion member is formed; and a first liquid supply system which supplies the liquid inside the liquid immersion member to form a liquid immersion space between the optical member and the object. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53)
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54. An exposure apparatus that exposes an object with an energy beam via an optical member and a liquid, the apparatus comprising:
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a liquid immersion member which is placed facing the object to form a liquid immersion space of the liquid including a beam path of the energy beam between the optical member and the object, and has a first recess section to form an auxiliary liquid immersion space in between with the object formed on a first surface to which the object is placed opposing; and a first liquid supply system which supplies the liquid to the liquid immersion space. - View Dependent Claims (55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82, 83, 84, 85, 86, 87, 88, 89, 90, 91, 92, 93, 94, 95, 96, 97, 98, 99, 100, 101, 102, 103, 104, 105, 106)
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107. A liquid immersion member which fills liquid in a space between an optical member and an object and forms a liquid immersion space, and is attached to an exposure apparatus which exposes the object with an energy beam via the optical member and the liquid, the member comprising:
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a main section which can be placed facing the object on an outer side of a beam path of the energy beam, and also has a space formed in the center to form the liquid immersion space, wherein a first recess section to form an auxiliary liquid immersion space between the object is formed on a first surface of the main section facing the object. - View Dependent Claims (108, 109, 110, 111, 112, 113, 114, 115, 116, 117, 118, 119, 120, 121, 122, 123, 124, 125, 126, 127, 128, 129, 130, 131, 132, 133, 134, 135, 136, 137)
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Specification