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EXPOSURE APPARATUS, LIQUID IMMERSION MEMBER, AND DEVICE MANUFACTURING METHOD

  • US 20110134400A1
  • Filed: 11/30/2010
  • Published: 06/09/2011
  • Est. Priority Date: 12/04/2009
  • Status: Abandoned Application
First Claim
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1. An exposure apparatus that exposes an object with an energy beam via an optical member and a liquid, the apparatus comprising:

  • a liquid immersion member which is placed facing the object on an outer periphery side of a beam path of the energy beam, and on a first surface to which the object is placed opposing, a first recess section to form an auxiliary liquid immersion space between the object and the liquid immersion member is formed; and

    a first liquid supply system which supplies the liquid inside the liquid immersion member to form a liquid immersion space between the optical member and the object.

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