PROCESS-GAS SUPPLY AND PROCESSING SYSTEM

• US 20110139272A1
• Filed: 08/28/2008
• Published: 06/16/2011
• Est. Priority Date: 08/30/2007
• Status: Abandoned Application

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Matsumoto, Kenji, Itoh, Hitoshi
• Application Number:
  US12/675,222
• Publication Number:
  US 20110139272A1
• Time in Patent Office: Days
• US Class Current: 137/511
• CPC Class Codes: C23C 16/448 characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
• CPC Class Codes: C23C 16/45561 Gas plumbing upstream of the reaction chamber
• CPC Class Codes: G05D 11/132 by controlling the flow of the individual components G05D11/133 takes precedence
• CPC Class Codes: Y10T 137/7837 Direct response valves [i.e., check valve type]
• CPC Class Codes: Y10T 137/8593 Systems

Abstract

A process-gas supply system 2 supplies a process gas diluted with a diluent gas to a gas using system 4. The process-gas supply system 2 includes a process gas tank 10, a diluent gas tank 12, a main gas duct 14 connecting the process gas tank 10 and the gas using system 4, and a diluent gas duct connecting the diluent gas tank 12 to the main gas duct. The respective main gas duct 14 and the diluent gas duct are provided with flow rate controllers FC1, FC2, and FC5. The diluent gas duct is connected to the main gas duct at a position on an immediately downstream side of one of a plurality of flow rate controllers other than the flow rate controller on the most downstream side. There is further provided a surplus-gas discharge duct 24 through which a surplus diluted process gas is discharged, the surplus-gas discharge duct 24 being connected to the main gas duct at a position on an immediately upstream side of one the flow rate controllers other than the flow rate controller on the most upstream side.

Claims

1. A process-gas supply system configured to supply a process gas diluted with a diluent gas to a gas using system, the process-gas supply system comprising:

a process gas tank configured to store the process gas;

a diluent gas tank configured to store the diluent gas;

a main gas duct connecting the process gas tank and the gas using system;

a plurality of flow rate controllers disposed on the main gas duct;

a diluent gas duct connecting the diluent gas tank to the main gas duct, the diluent gas duct being connected to the main gas duct at a position on an immediately downstream side of one of the flow rate controllers disposed on the main gas duct other than the flow rate controller on the most downstream side;

a flow rate controller disposed on the diluent gas duct; and

a surplus-gas discharge duct through which a surplus diluted process gas is discharged from the main gas duct, the surplus-gas discharge duct being connected to the main gas duct at a position on an immediately upstream side of one of the flow rate controllers disposed on the main gas duct other than the flow rate controller on the most upstream side.

2. The process-gas supply system according to claim 1, wherein

a pure process gas or a process gas diluted with a diluent gas to a predetermined density is accommodated in the process gas tank.

3. The process-gas supply system according to claim 1, further comprising a reusable gas duct connecting the surplus-gas discharge duct and the diluent gas duct,

wherein the reusable gas duct is configured such that all the discharged surplus gas or a part thereof in the surplus-gas discharge duct can be reused as the diluent gas.

4. The process-gas supply system according to claim 3, wherein

the reusable gas duct is provided with a process-gas removal filter configured to absorb the process gas from the diluted process gas containing the diluent gas and the process gas, and

the process-gas removal filter is configured to remove the process gas from the diluted process gas flowing through the reusable gas duct, and to allow the diluent gas to pass therethrough.

5. The process-gas supply system according to claim 1, further comprising a reusable gas duct connecting the surplus-gas discharge duct and an exhaust system disposed on the gas using system,

wherein the reusable gas duct is configured such that all the discharged surplus gas or a part thereof in the surplus-gas discharged duct can be reused as a purge gas for a vacuum pump of the exhaust system.

6. The process-gas supply system according to claim 5, wherein

the reusable gas duct is provided with a process-gas removal filter configured to absorb the process gas from the diluted process gas containing the diluent gas and the process gas, and

the process-gas removal filter is configured to remove the process gas from the diluted process gas flowing through the reusable gas duct, and to allow the diluent gas to pass therethrough.

7. The process-gas supply system according to claim 1, further comprising:

a density measuring instrument configured to measure a density of the process gas, the density measuring instrument being disposed on the main gas duct at a position immediately before the gas using system, or on the gas using system; and

a feedback control device configured to feedback-control a flow rate controller based on a value detected by the density measuring instrument.

8. The process-gas supply system according to claim 7, wherein

the flow rate controller to be feedback-controlled by the feedback control device is the flow rate controller disposed on the main gas duct.

9. The process-gas supply system according to claim 7, wherein

the flow rate controller to be feedback-controlled by the feedback control device is the flow rate controller disposed on the diluent gas duct.

10. The process-gas supply system according to claim 1, further comprising a discarded-gas discharge duct connected to the main gas duct at a position on the downstream side of the flow rate controller on the most downstream side,

wherein the discarded-gas discharge duct is configured such that the process gas flowing therethrough bypasses the gas using system and is discarded.

11. The process-gas supply system according to claim 1, wherein

the surplus-gas discharge duct is provided with a check valve that is opened when a pressure of the process gas reaches or exceeds a predetermined pressure.

12. The process-gas supply system according to claim 11, wherein

the surplus-gas discharge duct is provided with a needle valve at a position on the upstream side of the check valve.

13. The process-gas supply system according to claim 1, further comprising:

a pressure gauge disposed on the main gas duct, the pressure gauge being configured to measure a gas pressure in the main gas duct;

a pressure regulating valve disposed on the surplus-gas discharge duct; and

a valve control device configured to control a valve opening degree of the pressure regulating valve based on a value measured by the pressure gauge.

14. The process-gas supply system according to claim 1, wherein

a part of the main gas duct, which part is located between a connection position to which the surplus-gas discharge duct is connected and a connection position to which the diluent gas duct is connected on the downstream side of the former connection point to which the surplus-gas discharge duct is connected, has a cross section smaller than those of other parts of the main gas duct, the other parts being located adjacent to the part on the upstream side and the downstream side.

15. The process-gas supply system according to claim 1, further comprising:

a zirconia-type density measuring instrument disposed on the main gas duct, the zirconia-type measuring instrument being configured to measure an oxygen density of a gas in the main gas duct; and

a feedback control part configured to feedback-control a flow rate controller based on a value detected by the zirconia-type density measuring instrument.

16. The process-gas supply system according to claim 15, further comprising a measuring-instrument bypass pipe provided with an opening and closing valve, the measuring-instrument bypass pipe being disposed on the main gas duct,

wherein the measuring-instrument bypass pipe is configured such that the process gas flowing therethrough bypasses the zirconia-type measuring instrument.

17. The process-gas supply system according to claim 1, wherein

the gas using system is a film deposition apparatus configured to deposit a film on a surface of an object to be processed, or an annealing apparatus configured to anneal an object to be processed on which a film has been formed.

18. The process-gas supply system according to claim 17, wherein

the film is any one of a CuMn film, a high dielectric constant film, an Mn film, and a film containing Mn.

19. The process-gas supply system according to claim 1, further comprising a mixer disposed on the main gas duct at a position to which the diluent gas duct is connected.

20. The process-gas supply system according to claim 1, wherein

the diluent gas is formed of one or more gases selected from the group consisting of an N₂ gas and a rare gas.

21. The process-gas supply system according to claim 1, wherein

the process gas is an O₂ gas.

38. A processing system configured to subject an object to be processed to a predetermined process, the processing apparatus comprising:

a processing container capable of accommodating one or more objects to be processed;

a gas introduction member configured to introduce a gas into the processing container; and

the process-gas supply system according to claim 1, connected to the gas introduction member for supplying a process gas diluted with a diluent gas into the processing container.

39. The processing system according to claim 38, further comprising an exhaust system configured to discharge an atmosphere in the processing container,

wherein the exhaust system includes:

a main exhaust duct provided with an opening and closing valve and a vacuum pump; and

a bypass exhaust duct provided with an opening and closing valve, for atmospheric pressure process, the bypass exhaust duct being connected to the main exhaust duct such that the bypass exhaust duct bypasses the vacuum pump.

22. A process-gas supply system configured to supply a process gas diluted with a diluent gas to a gas using system, the process-gas supply system comprising:

a liquid material tank configured to store a liquid material of the process gas;

a diluent gas tank configured to store the diluent gas;

a main gas duct connecting the liquid material tank and the gas using system;

a flow rate controller disposed on the main gas duct; and

a diluent gas duct connecting the diluent gas tank to the main gas duct, the diluent gas duct being connected to the main gas duct at a position on a downstream side of the flow rate controller disposed on the main gas duct.

23. The process-gas supply system according to claim 22, wherein

the liquid material tank is configured such that a process gas, which is generated by evaporating the liquid material in the liquid material tank, outflows to the main gas duct.

24. The process-gas supply system according to claim 22, further comprising:

a plurality of flow rate controllers disposed on the main gas duct; and

a surplus-gas discharge duct through which a surplus diluted process gas is discharged from the main gas duct, the surplus-gas discharge duct being connected to the main gas duct at a position on an immediately upstream side of one of the flow rate controllers disposed on the main gas duct other than the flow rate controller on the most upstream side,

wherein the diluent gas duct is connected to the main gas duct at a position on an immediately downstream side of one of the flow rate controllers disposed on the main gas duct other than the flow rate controller on the most downstream side.

25. The process-gas supply system according to claim 22, further comprising a pressure regulating valve mechanism disposed on the main gas duct at a position on the immediately

a surplus-gas discharge duct through which a surplus diluted process gas is discharged from the main gas duct, the surplus-gas discharge duct being connected to the main gas duct at a position on an immediately upstream side of one of the flow rate controllers disposed on the main gas duct other than the flow rate controller on the most upstream side;

wherein the diluent gas duct is connected to the main gas duct at a position on an immediately downstream side of one of the flow rate controllers disposed on the main gas duct other than the flow rate controller on the most downstream side.

30. The process-gas supply system according to claim 27, further comprising a pressure regulating valve mechanism disposed on the main gas duct at a position on an immediately downstream side of the liquid material tank.

31. The process-gas supply system according to claim 27, wherein

the process gas is a steam.

32. A process-gas supply system configured to supply a process gas diluted with a diluent gas to a gas using system, the process-gas supply system comprising:

a process-gas forming part configured to form the process gas;

a diluent gas tank configured to store the diluent gas;

a main gas duct connecting the process-gas forming part and the gas using system;

a flow rate controller disposed on the main gas duct;

a diluent gas duct connecting the diluent gas tank to the main gas duct, the diluent gas duct being connected to the main gas duct at a position on an upstream side of the flow rate controller disposed on the main gas duct;

a flow rate controller disposed on the diluent gas duct; and

a surplus-gas discharge duct through which a surplus diluted process gas is discharged from the main gas duct, the surplus-gas discharge duct being connected to the main gas duct at a position on the immediately upstream side of the flow rate controller disposed on the main gas duct.

33. The process-gas supply system according to claim 32, wherein

the process-gas forming part includes:

a material-gas supply system configured to supply a plurality of material gases for forming the process gas, with flow rates of the material gases being independently controlled; and

a reaction part configured to react the plurality of material gases from the material-gas supply system so as to form the process gas.

34. The process-gas supply system according to claim 32, wherein

the plurality of material gases are an H₂ gas and an O₂ gas, and the process gas is a steam.

35. The process-gas supply system according to claim 32, further comprising:

a density measuring instrument configured to measure a density of the process gas, the density measuring instrument being disposed on the main gas duct at a position immediately before the gas using system, or on the gas using system; and

a feedback control device configured to feedback-control a flow rate controller based on a value detected by the density measuring instrument.

36. The process-gas supply system according to claim 35, wherein

the flow rate controller to be feedback-controlled by the feedback control device is the flow rate controller disposed on the main gas duct, or a flow rate controller disposed on the process-gas forming part.

37. The process-gas supply system according to claim 35, wherein

the flow rate controller to be feedback-controlled by the feedback control device is the flow rate controller disposed on the diluent gas duct.