PROCESS-GAS SUPPLY AND PROCESSING SYSTEM
First Claim
1. A process-gas supply system configured to supply a process gas diluted with a diluent gas to a gas using system, the process-gas supply system comprising:
- a process gas tank configured to store the process gas;
a diluent gas tank configured to store the diluent gas;
a main gas duct connecting the process gas tank and the gas using system;
a plurality of flow rate controllers disposed on the main gas duct;
a diluent gas duct connecting the diluent gas tank to the main gas duct, the diluent gas duct being connected to the main gas duct at a position on an immediately downstream side of one of the flow rate controllers disposed on the main gas duct other than the flow rate controller on the most downstream side;
a flow rate controller disposed on the diluent gas duct; and
a surplus-gas discharge duct through which a surplus diluted process gas is discharged from the main gas duct, the surplus-gas discharge duct being connected to the main gas duct at a position on an immediately upstream side of one of the flow rate controllers disposed on the main gas duct other than the flow rate controller on the most upstream side.
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Accused Products
Abstract
A process-gas supply system 2 supplies a process gas diluted with a diluent gas to a gas using system 4. The process-gas supply system 2 includes a process gas tank 10, a diluent gas tank 12, a main gas duct 14 connecting the process gas tank 10 and the gas using system 4, and a diluent gas duct connecting the diluent gas tank 12 to the main gas duct. The respective main gas duct 14 and the diluent gas duct are provided with flow rate controllers FC1, FC2, and FC5. The diluent gas duct is connected to the main gas duct at a position on an immediately downstream side of one of a plurality of flow rate controllers other than the flow rate controller on the most downstream side. There is further provided a surplus-gas discharge duct 24 through which a surplus diluted process gas is discharged, the surplus-gas discharge duct 24 being connected to the main gas duct at a position on an immediately upstream side of one the flow rate controllers other than the flow rate controller on the most upstream side.
345 Citations
39 Claims
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1. A process-gas supply system configured to supply a process gas diluted with a diluent gas to a gas using system, the process-gas supply system comprising:
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a process gas tank configured to store the process gas; a diluent gas tank configured to store the diluent gas; a main gas duct connecting the process gas tank and the gas using system; a plurality of flow rate controllers disposed on the main gas duct; a diluent gas duct connecting the diluent gas tank to the main gas duct, the diluent gas duct being connected to the main gas duct at a position on an immediately downstream side of one of the flow rate controllers disposed on the main gas duct other than the flow rate controller on the most downstream side; a flow rate controller disposed on the diluent gas duct; and a surplus-gas discharge duct through which a surplus diluted process gas is discharged from the main gas duct, the surplus-gas discharge duct being connected to the main gas duct at a position on an immediately upstream side of one of the flow rate controllers disposed on the main gas duct other than the flow rate controller on the most upstream side. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 38, 39)
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22. A process-gas supply system configured to supply a process gas diluted with a diluent gas to a gas using system, the process-gas supply system comprising:
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a liquid material tank configured to store a liquid material of the process gas; a diluent gas tank configured to store the diluent gas; a main gas duct connecting the liquid material tank and the gas using system; a flow rate controller disposed on the main gas duct; and a diluent gas duct connecting the diluent gas tank to the main gas duct, the diluent gas duct being connected to the main gas duct at a position on a downstream side of the flow rate controller disposed on the main gas duct. - View Dependent Claims (23, 24, 25)
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30. The process-gas supply system according to claim 27, further comprising a pressure regulating valve mechanism disposed on the main gas duct at a position on an immediately downstream side of the liquid material tank.
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31. The process-gas supply system according to claim 27, wherein
the process gas is a steam.
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32. A process-gas supply system configured to supply a process gas diluted with a diluent gas to a gas using system, the process-gas supply system comprising:
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a process-gas forming part configured to form the process gas; a diluent gas tank configured to store the diluent gas; a main gas duct connecting the process-gas forming part and the gas using system; a flow rate controller disposed on the main gas duct; a diluent gas duct connecting the diluent gas tank to the main gas duct, the diluent gas duct being connected to the main gas duct at a position on an upstream side of the flow rate controller disposed on the main gas duct; a flow rate controller disposed on the diluent gas duct; and a surplus-gas discharge duct through which a surplus diluted process gas is discharged from the main gas duct, the surplus-gas discharge duct being connected to the main gas duct at a position on the immediately upstream side of the flow rate controller disposed on the main gas duct. - View Dependent Claims (33, 34, 35, 36, 37)
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Specification